首页> 外文OA文献 >Solution processed metal oxide microelectronics: from materials to devices
【2h】

Solution processed metal oxide microelectronics: from materials to devices

机译:溶液处理金属氧化物微电子:从材料到器件

摘要

Owing to their many interesting characteristics, the application of metal oxide based electronics has been growing at a considerable rate for the past ten years. High performance, optical transparency, chemical stability and suitability toward low cost deposition methods make them well suited to a number of new and interesting application areas which conventional materials such as silicon, or more recently organic materials, are unable to satisfy.The work presented in this thesis is focussed on the optimisation of high performance metal oxide based electronics combined with use of spray pyrolysis, as a low cost deposition method. The findings presented here are split into three main areas, starting with an initial discussion on the physical and electronic properties of films deposited by spray pyrolysis. The results demonstrate a number of deposition criteria that aid in the optimisation and fabrication of high performance zinc oxide (ZnO) based thin-film transistors (TFTs) with charge carrier mobilities as high a 20 cm2/Vs. Solution processed gallium oxide TFTs with charge carrier mobilities of ~0.5 cm2/Vs are also demonstrated, highlighting the flexibility of the deposition method. The second part of the work explores the use of facile chemical doping methods suitable for spray pyrolysed ZnO based TFTs. By blending different precursor materials in solution prior to deposition, it has been possible to adjust certain material characteristics, and in turn device performance. Through the addition of lithium it has been possible alter the films grain structure, leading to significantly improved charge carrier mobilities as high as ~54 cm2/Vs. Additionally the inclusion of beryllium during film deposition has been demonstrated to control TFT threshold voltages, leading to improved integrated circuit performance. The final segment of work demonstrates the flexibility of spray pyrolysis through the deposition of a number of high-k dielectric materials. These high performance dielectrics are integrated into the fabrication of TFTs already benefiting from the findings of the previously discussed work, leading to highly optimised low-voltage TFTs. The performance of these devices represent some of best currently available from solution processed ZnO TFTs with charge carrier mobilities as high as 85 cm2/Vs operating at 3.5 V.
机译:由于其许多有趣的特性,基于金属氧化物的电子产品的应用在过去十年中以可观的速度增长。高性能,光学透明性,化学稳定性以及对低成本沉积方法的适用性使它们非常适合许多新的有趣的应用领域,而传统的材料(例如硅或最近的有机材料)无法满足这些领域。本论文的重点是优化基于高性能金属氧化物的电子器件,并结合使用喷雾热解技术,作为一种低成本的沉积方法。此处介绍的发现分为三个主要领域,首先是对通过喷雾热解沉积的薄膜的物理和电子性质的初步讨论。结果证明了许多沉积准则,这些准则有助于优化和制造具有高达20 cm2 / Vs的载流子迁移率的高性能氧化锌(ZnO)基薄膜晶体管(TFT)。还展示了电荷载流子迁移率为〜0.5 cm2 / Vs的固溶处理氧化镓TFT,突出了沉积方法的灵活性。工作的第二部分探讨了适用于喷雾热解ZnO基TFT的简便化学掺杂方法的使用。通过在沉积之前在溶液中混合不同的前体材料,可以调节某些材料特性,进而调节器件性能。通过添加锂,有可能改变薄膜的晶粒结构,从而显着提高电荷载流子迁移率,高达〜54 cm2 / Vs。另外,已经证明在膜沉积期间包含铍可控制TFT阈值电压,从而改善集成电路性能。最后的工作展示了通过沉积多种高k电介质材料进行喷雾热解的灵活性。这些高性能电介质已集成到TFT的制造中,这些材料已经从先前讨论的工作中受益,从而带来了高度优化的低压TFT。这些器件的性能代表了目前可通过溶液处理的ZnO TFT获得的一些最佳性能,其载流子迁移率高达85 cm2 / Vs,工作电压为3.5V。

著录项

  • 作者

    Thomas Stuart R.;

  • 作者单位
  • 年度 2014
  • 总页数
  • 原文格式 PDF
  • 正文语种
  • 中图分类

相似文献

  • 外文文献
  • 中文文献
  • 专利

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号