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Deposition Methods and Thermoresistive Properties of Vanadium Oxide and Amorphous Silicon Thin Films

机译：氧化钒和非晶硅薄膜的沉积方法和热阻特性

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Zou Mengyang;
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年度 2015
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正文语种 English
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1. Beyond surface nanoindentation: Combining static and dynamic nanoindentation to assess intrinsic mechanical properties of chemical vapor deposition amorphous silicon oxide (SiO_x) and silicon oxycarbide (SiO_xC_y) thin films [J] . Puyo Maxime, Topka Konstantina Christina, Diallo Babacar, Thin Solid Films . 2021,第Octa1期

机译：除了表面纳米内狭窄：结合静态和动态纳米indentation，评估化学气相沉积非晶氧化硅（SiO_x）和氧化硅（SiO_XC_Y）薄膜的内在力学性能
2. Effect of N_2O/SiH_4 flow ratios on properties of amorphous silicon oxide thin films deposited by inductively-coupled plasma chemical vapor deposition with application to silicon surface passivation [J] . Dao V.-A., Nguyen V.-D., Heo J., Vacuum: Technology Applications & Ion Physics: The International Journal & Abstracting Service for Vacuum Science & Technology . 2009,第3期

机译：N_2O / SiH_4流量比对电感耦合等离子体化学气相沉积法制备非晶硅氧化物薄膜的影响及其在硅表面钝化中的应用
3. Electron back-scattered diffraction of crystallized vanadium dioxide thin films on amorphous silicon dioxide [J] . Felipe Rivera, Laurel Burk, Robert Davis, Thin Solid Films . 2012,第7期

机译：非晶态二氧化硅上结晶二氧化钒薄膜的电子背散射衍射
4. Comparative investigations of the bolometric properties of thin film structures based on vanadium dioxide and amorphous hydrated silicon [C] . V.G. Malyarov, S.I. Vavilov State Optical Institute, St. Petersburg, International conference on photoelectronics and night vision devices . 1999

机译：基于二氧化钒和非晶态水合硅的薄膜结构的辐射热性能的比较研究
5. Characterization of amorphous silicon carbide and silicon carbonitride thin films synthesized by polymer-source chemical vapor deposition. Mechanical structural and metal-interface properties [D] . Awad, Yousef 2006

机译：通过聚合物源化学气相沉积合成的非晶碳化硅和碳氮化硅薄膜的表征。机械结构和金属界面性能
6. Amorphous Vanadium Oxide Thin Films as Stable Performing Cathodes of Lithium and Sodium-Ion Batteries [O] . Shaikshavali Petnikota, Rodney Chua, Yang Zhou, 2018

机译：非晶态氧化钒薄膜作为稳定的锂和钠离子电池阴极
7. Influence of pressure and radio frequency power on deposition rate and structural properties of hydrogenated amorphous silicon thin films prepared by plasma deposition [O] . Andújar Bella José Luis, Bertrán Serra Enric, Canillas i Biosca Adolf, 1987

机译：压力和射频功率对等离子体沉积氢化非晶硅薄膜沉积速率和结构性能的影响

Deposition Methods and Thermoresistive Properties of Vanadium Oxide and Amorphous Silicon Thin Films

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