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Synergistic etch rates during low-energetic plasma etching for hydrogenated amorphous carbon

机译：低能等离子体蚀刻氢化非晶碳过程中的协同蚀刻速率

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Hansen, Terje, TAR; Weber, JW Jan-Willem; Colsters, PGJ Paul; Mestrom, DMHG; Sanden, van de, MCM Richard; Engeln, RAH Richard;
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1. Synergistic etch rates during low-energetic plasma etching of hydrogenated amorphous carbon [J] . T. A. R. Hansen, J. W. Weber, P. G. J. Colsters, Journal of Applied Physics . 2012,第1期

机译：低能等离子体蚀刻氢化非晶碳过程中的协同蚀刻速率
2. Etching characteristics of hydrogenated amorphous carbon withdifferentsp~2/sp~3 hybridization ratios inCF_4/O_2 plasmas [J] . Li Jie, Kim Sun J., Han Seunghun, Plasma processes and polymers . 2021,第11期

机译：蚀刻特性氢化无定形碳与Differentsp〜2 / sp〜3杂交率Incf_4 / O_2等离子体
3. Behavior of human umbilical vein endothelial cells on micro-patterned amorphous hydrogenated carbon films produced by plasma immersion ion implantation & deposition and plasma etching [J] . F.J. Jing, N. Huang, L. Wang Diamond and Related Materials . 2007,第3期

机译：人脐静脉内皮细胞在等离子浸没离子注入和沉积以及等离子刻蚀产生的微图案非晶氢化碳膜上的行为
4. In situ plasma analysis, fluorine incorporation, thermostability, stress, and hardness comparison of fluorinated amorphous carbon and hydrogenated amorphous carbon thin films deposited on Si by plasma enhanced chemical vapor deposition [C] . A.D.Glew, M.A.Cappelli, M.N.Touzelbaev, Symposium on low-dielectric constant materials . 1999

机译：原位等离子体分析，通过等离子体增强化学气相沉积法沉积在Si上的氟化非晶碳和氢化非晶碳薄膜的氟掺入，热稳定性，应力和硬度比较
5. High precision plasma etch for pattern transfer: Towards fluorocarbon based atomic layer etching [D] . Metzler, Dominik. 2016

机译：用于图案转移的高精度等离子刻蚀：基于碳氟化合物的原子层刻蚀
6. Plasma Supported Deposition of Amorphous Hydrogenated Carbon (a-C:H) on Polyamide 6: Determining Interlayer Completion and Dehydrogenation Effects during Layer Growth [O] . Torben Schlebrowski, Henriette Lüber, Lucas Beucher, 2021

机译：在聚酰胺6上的血浆支持沉积非晶氢化碳（A-C：H）：在层生长期间确定层间完成和脱氢效应
7. Hard graphitelike hydrogenated amorphous carbon growth at high rates by a remote plasma [O] . Singh, SV Vikram, Zaharia, Teodor, T, Creatore, M Adriana, 2010

机译：远程等离子体使硬质类石墨氢化无定形碳高速生长

Synergistic etch rates during low-energetic plasma etching for hydrogenated amorphous carbon

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