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udGrazing incidence X-ray diffraction (GIRXD) study of the phase composition of SiC (x) Fe (y) and SiC (x) N (y) Fe (z) thin filmsud

机译:UD掠入射X射线衍射(GIRXD)研究siC(x)Fe(y)和siC(x)N(y)Fe(z)薄膜的相组成 ud

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摘要

Films of various composition are synthesized by chemical vapor deposition under low pressure using the thermal decomposition of the following initial gas mixtures: ferrocene Fe(C5H5)(2) and helium; ferrocene, tris(diethylamino)silane [(C2H5)(2)N](3)SiH (TDEAS) and helium; ferrocene, 1,1,1,3,3,3-hexamethyldisilazane [(CH3)(3)Si](2)NH (HMDS), and helium. The chemical composition of the films obtained is analyzed by FTIR and Raman spectroscopies. The phase composition of the films is studied by grazing incidence X-ray diffraction (GIXRD). It is determined that the films grown from the gas mixtures of organiosilicon compounds (TDEAS or HMDS), ferrocene, and helium have the same chemical and phase composition (SiC (x) N (y) Fe (z) ), while the films obtained from the mixture of ferrocene and helium have another composition (SiC (x) Fe (y) ).
机译:利用以下初始气体混合物的热分解,通过低压化学气相沉积法合成各种组成的薄膜:二茂铁Fe(C5H5)(2)和氦气;二茂铁,三(二乙氨基)硅烷[(C2H5)(2)N](3)SiH(TDEAS)和氦气;二茂铁,1,1,1,3,3,3-六甲基二硅氮烷[(CH3)(3)Si](2)NH(HMDS)和氦气。通过FTIR和拉曼光谱分析所获得的膜的化学组成。通过掠入射X射线衍射(GIXRD)研究了薄膜的相组成。已确定,由有机硅化合物(TDEAS或HMDS),二茂铁和氦气的气体混合物生长的薄膜具有相同的化学和相组成(SiC(x)N(y)Fe(z)),而获得的薄膜由二茂铁和氦气的混合物组成的另一种成分(SiC(x)Fe(y))。

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