首页> 外文OA文献 >Effect of thickness on dielectric, ferroelectric, and optical properties of Ni substituted Pb(Zr0.2Ti0.8)O-3 thin films
【2h】

Effect of thickness on dielectric, ferroelectric, and optical properties of Ni substituted Pb(Zr0.2Ti0.8)O-3 thin films

机译:厚度对Ni取代pb(Zr0.2Ti0.8)O-3薄膜介电,铁电和光学性质的影响

代理获取
本网站仅为用户提供外文OA文献查询和代理获取服务,本网站没有原文。下单后我们将采用程序或人工为您竭诚获取高质量的原文,但由于OA文献来源多样且变更频繁,仍可能出现获取不到、文献不完整或与标题不符等情况,如果获取不到我们将提供退款服务。请知悉。

摘要

We report thickness dependent dielectric, ferroelectric, and optical properties of Ni substituted Pb(Zr0.2Ti0.8)O-3 thin films. The Pb(Zr0.2Ti0.8)(0.70)Ni0.30O3-delta (PZTNi30) thin films for various thicknesses, ranging from 5 nm to 400 nm, were fabricated by pulsed laser deposition technique. Giant dielectric dispersion, low dielectric loss, large dielectric constant similar to 1000-1500 from 100 Hz to 100 kHz, and diffused dielectric anomaly near 570-630K were observed in PZTNi30 thin films. These films show well saturated ferroelectric hysteresis, with large remanent polarization. It also illustrated excellent optical transparency which decreased from 82 to 72% with increasing film thickness from 5 nm to 400 nm for the probe wavelengths ranging from 200 to 1100 nm. A decrease in direct bandgap (E-g) values from 4 eV to 3.4 eV and indirect-E-g values from 3.5 eV to 2.9 eV were observed for PZTNi30 thin films with increase in film thickness from 5 nm to 400 nm, respectively. The direct and indirect bandgaps were discussed in context of film thickness and grain size effects. Our investigations on optical properties of PZTNi30 thin films suggest that bandgap can be modified as a function of film thickness which may be useful for readers working to develop novel candidates for ferroelectric photovoltaic.
机译:我们报告了镍取代的Pb(Zr0.2Ti0.8)O-3薄膜的厚度依赖性介电,铁电和光学性质。通过脉冲激光沉积技术制备了厚度范围从5 nm到400 nm的Pb(Zr0.2Ti0.8)(0.70)Ni0.30O3-δ(PZTNi30)薄膜。在PZTNi30薄膜中观察到巨大的介电色散,低介电损耗,从100 Hz到100 kHz的大介电常数,类似于1000-1500,以及在570-630K附近的扩散介电异常。这些薄膜显示出良好的饱和铁电磁滞,具有较大的剩余极化。它还显示了出色的光学透明性,对于200至1100 nm的探针波长,随着膜厚从5 nm增加至400 nm,其光学透明度从82%降低至72%。对于PZTNi30薄膜,直接带隙(E-g)值从4 eV降低到3.4 eV,间接E-g值从3.5 eV降低到2.9 eV,并且膜厚从5 nm增加到400 nm。在膜厚度和晶粒尺寸效应的背景下讨论了直接和间接带隙。我们对PZTNi30薄膜的光学性能的研究表明,带隙可以随膜厚而变化,这可能对致力于开发新型铁电光伏候选材料的读者有用。

著录项

相似文献

  • 外文文献
  • 中文文献
  • 专利
代理获取

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号