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Efficiency and Optimum DC Bias Field for Second Harmonic Generation due to Hot Electrons In Semiconductors

机译:半导体中热电子引起的二次谐波产生的效率和最佳直流偏置场

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摘要

The efficiency of the yield of second harmonics in nonpolar nondegeneratesemiconductors is estimated by a simple method without using the Boltzmanntransport equation. For n-Ge and n-Si, the efficiency of 4 to 5 percent isobtained for the optimum dc bias field, about Vo/μo, i.e., the ratio of thesaturation velocity to the low-field mobility. In order to give this estimation,a hyperbolic equation is assumed, which may describe the nonlinear velocityelectricfield relation from the ohmic region up to the saturation region inthe temperature range between 77 and 300K. The velocity-field characteristic,by this approximation is found to be in good agreement with the experiment.It is suggested that the optimum field for n-Ge is lower than that for n-Si,and that the optimum bias field in both n-Ge and n-Si is decreased in thetemperature range of interest as the temperature is lowered.
机译:非极性非简并半导体中二次谐波的产生效率可通过简单方法估算,而无需使用玻尔兹曼输运方程。对于n-Ge和n-Si,对于最佳的直流偏置场(约为Vo /μo),即饱和速度与低场迁移率之比,可获得4%至5%的效率。为了给出该估计,假设一个双曲线方程,该方程可以描述在77至300K之间的温度范围内从欧姆区域到饱和区域的非线性速度电场关系。通过这种近似,发现速度场特性与实验非常吻合。建议n-Ge的最佳场低于n-Si的场,并且在感兴趣的温度范围内,随着温度降低,n-Ge和n-Si的最佳偏置场均减小。

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