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The production and properties of TCO coatings prepared by pulsed magnetron sputtering from powder targets

机译:粉末靶脉冲磁控溅射制备TCO涂层的生产和性能

摘要

Mith their unique transparent and conductive properties, TCO (transparent conductive oxide) coatings are becoming increasingly studied These commercially important coatings have a promising future due to their various applications as components in optoelectronic devices, photovoltaic solar cells, flat panel displays, electroluminescent devices, etc. Their high transmittance and low resistivity are generally achieved through the use of specific dopant materials, whilst adjustments are made to the deposition processes to improve the structure of the coatings. TCO coatings are commonly deposited by the magnetron sputtering process. Sputtering normally takes place from a solid plate, known as the target, of the material to be deposited. Clearly, each solid target can only be of a single composition. Thus, to change the compositions ofthe coatings, the whole target has to be replaced Furthermore, alloy, or doped targets can be very expensive and the choice ofavailable compositions is likely to be limited. In this project, instead of using solid targets, metal or ceramic powder blends were used as the targets. The powder blends were spread across the surface of a magnetron and lightly tamped down to produce a smooth surface. The benefits of this approach are that any material that is available in powderform can be considered as a target material and alloy or multi-component compositions can be readily blended The basic aim of this project, therefore, was to produce novel TCO coatings by magnetron sputteringfrom powder targets. The coatings were deposited in a specially designed rig with a number of important features, including a pulsed DC power supply and a closed magnetic field. The project concentrated on the production of commercially useful zinc oxide-based TCO coatings. Coatings were produced with different dopant materials and concentrations, and their optical and electrical properties were measured. After the coatings were annealed at 500 *Cfor 2 hours in vacuo, aluminum and gallium doped zinc oxide coatings showed their low resistivity, which were no larger than 5.19xI0-3S2cm, and the lowest resistivity was obtained from 3at% A 1-doped ZnO coating; 1.95 xI 00cm. The average transmittance in the visible range of the ZnO coatings was 90%. From this, optimal compositions were identified For comparison purposes, coatings were also produced of the TCO material most commonly used at present; namely ITO (Indium tin oxide). The results showed that ITO coatings generally had lower resistivity and visible transmittance, (4-6xlO-492cm and 80-8216), than doped ZnO coatings. Also, the electrical and optical properties of ITO coatings were very sensitive to the content of oxygen in the deposition atmosphere. Finally, theflexibility offered by this approach was exploited through the use of multi-component target compositions to produce TCO coatings with tailored optical and electrical properties.
机译:TCO(透明导电氧化物)涂料不仅具有其独特的透明和导电性能,而且正受到越来越多的研究。这些在商业上很重要的涂料因其在光电器件,光伏太阳能电池,平板显示器,电致发光器件等领域的各种应用而具有广阔的发展前景它们的高透射率和低电阻率通常是通过使用特定的掺杂剂材料来实现的,同时对沉积工艺进行了调整以改善涂层的结构。 TCO涂层通常通过磁控溅射工艺沉积。溅射通常从要沉积的材料的称为目标的实心板进行。显然,每个固体靶只能具有单一组成。因此,为了改变涂层的成分,必须更换整个靶材。此外,合金或掺杂靶材可能非常昂贵,并且可用成分的选择可能受到限制。在该项目中,不是使用固体靶材,而是将金属或陶瓷粉末混合物用作靶材。将粉末共混物散布在磁控管的整个表面上,并轻轻地压实以产生光滑的表面。这种方法的好处是,可以将粉末形式的任何材料视为目标材料,并且可以轻松地混合合金或多组分组合物。因此,该项目的基本目的是通过磁控管溅射生产新型TCO涂层粉末目标。涂层沉积在具有许多重要特征的经过特殊设计的设备中,包括脉冲直流电源和封闭磁场。该项目集中于生产商业上有用的基于氧化锌的TCO涂料。用不同的掺杂剂材料和浓度制备涂层,并测量其光学和电学性质。在真空中将涂层在500°C下退火2小时后,铝和镓掺杂的氧化锌涂层显示出低电阻率,不大于5.19xI0-3S2cm,并且从3at%的A 1掺杂的ZnO获得最低的电阻率涂层; 1.95 xI 00厘米ZnO涂层可见光范围内的平均透射率为90%。由此,确定了最佳的组成。为了进行比较,还生产了目前最常用的TCO材料的涂层。即ITO(铟锡氧化物)。结果表明,与掺杂的ZnO涂层相比,ITO涂层的电阻率和可见光透射率通常较低(4-6x10-492cm和80-8216)。另外,ITO涂层的电学和光学特性对沉积气氛中的氧气含量非常敏感。最后,通过使用多组分靶组合物来开发这种方法提供的灵活性,以生产具有定制的光学和电气性能的TCO涂层。

著录项

  • 作者

    Zhou Y;

  • 作者单位
  • 年度 2005
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  • 原文格式 PDF
  • 正文语种 English
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