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High quality YBa2Cu3O7-delta films with controllable in-plane orientations grown on yttria-stabilized zirconia substrates

机译:在氧化钇稳定的氧化锆衬底上生长可控面内取向的高质量YBa2Cu3O7-δ薄膜

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摘要

[[abstract]]The pulsed-laser deposition (PLD) technique was used to grow high T-C superconducting YBa2Cu3O7-delta (YBCO) films on both virgin and ion-bombarded yttria-stabilized zirconia (YSZ) substrates. To pattern high T-C films for device applications, the ion milling technique is often used to turn virgin YSZ substrates into ion-bombarded substrates. Multilayered processes require the growth of high T-C films on these ion-bombarded substrates. The purpose of this work was to investigate the growing conditions for these two kinds of substrate surfaces. We found that high quality 0 degrees in-plane orientation films can be grown on either substrate when the growth temperature is about 810 degrees C. The thin film grown at this temperature has T-C of about 90.3 K and J(C) of about 4x10(6) A cm(-2) at 77 K. On virgin substrates, the in-plane orientations of YBCO films grown within the temperature range of 790-730 degrees C exhibit a mixture of 0 degrees and 45 degrees domains. As the growth temperature decreases, the dominant orientation shifts gradually from 0 degrees to 45 degrees. On the other hand, on ion-bombarded YSZ substrates, the in-plane orientation of YBCO films grown within the same temperature range shows that the 45 degrees domain is more prominent. Furthermore, 9 degrees subpeaks appear around the 0 degrees peak on ion-bombarded YSZ substrates. At a lower growth temperature of around 690 degrees C, only the 45 degrees domain exists on the virgin substrate, while a small amount of 0 degrees domain is present with the majority of 45 degrees domain on the ion-bombarded substrate. The T-C and J(C) of the films grown at around 690 degrees C on virgin substrates are as good as films grown at high temperatures, despite the difference in the in-plane orientations.
机译:[[摘要]]使用脉冲激光沉积(PLD)技术在原始和离子轰击的氧化钇稳定氧化锆(YSZ)衬底上生长高T-C超导YBa2Cu3O7-δ(YBCO)膜。为了使高T-C膜图案化以用于设备应用,通常使用离子铣削技术将原始的YSZ衬底变成离子轰击衬底。多层工艺要求在这些离子轰击基板上生长高T-C膜。这项工作的目的是研究这两种基材表面的生长条件。我们发现,当生长温度约为810℃时,可以在任一基板上生长高质量的0度面内取向膜。在该温度下生长的薄膜的TC约为90.3 K,J(C)约为4x10( 6)在77 K时的cm(-2)。在原始衬底上,在790-730摄氏度的温度范围内生长的YBCO膜的面内取向显示0度和45度畴的混合。随着生长温度降低,主要取向从0度逐渐移至45度。另一方面,在离子轰击的YSZ基板上,在相同温度范围内生长的YBCO膜的面内取向显示45度畴更加突出。此外,在离子轰击YSZ基板上0度峰附近出现9度亚峰。在大约690摄氏度的较低生长温度下,原始衬底上仅存在45度畴,而离子轰击衬底上仅存在少量0度畴,而大部分为45度畴。尽管面内取向有所不同,但在原始基材上于690摄氏度左右生长的薄膜的T-C和J(C)与高温下生长的薄膜一样好。

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    Lin PA;

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  • 年度 2011
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  • 正文语种 [[iso]]en
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