[[abstract]]Co/Pt multilayers were prepared on silicon substrates with a Ag buffer of different thickness and Pt intermediate layers by using the molecular-beam epitaxial technique. The as-deposited films (at 160°C) were then post-annealed for 30 min in a vacuum at a temperature (Tan) ranging from 260°C to 500°C. The formation of CoPt L1o-ordered structure were observed for all the samples grown at 160°C. The out-of-plane coercivity (Hc perpendicular ) and saturation magnetization (Ms perpendicular ) of all Co/Pt multilayer films decreased monotonically as elevating annealing temperature, owing to the heavy diffusion of Si into Co/Pt films at higher temperatures. When Tan reaches 500°C, the formation of PtSi phase destroys the magnetic properties.
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机译:通过分子束外延技术,在具有不同厚度的Ag缓冲层和Pt中间层的硅基板上制备了[[]] Co / Pt多层膜。然后将所沉积的膜(在160℃下)在真空中在260℃至500℃的温度(Tan)下后退火30分钟。对于在160°C下生长的所有样品,均观察到了CoPt L10序结构的形成。所有的Co / Pt多层膜的面外矫顽力(Hc垂直)和饱和磁化强度(Ms垂直)随着退火温度的升高而单调降低,这是由于在较高温度下Si大量扩散到Co / Pt膜中。当Tan达到500°C时,PtSi相的形成破坏了磁性。
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