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Real-time feedback control of plasma density in inductively coupled plasmas

机译:电感耦合等离子体中等离子体密度的实时反馈控制

摘要

[[abstract]]Summary form only given. The real-time feedback control has the potential to enhance the process reliability of VLSI fabrication. Most of the studies on real-time feedback control of plasma processing tools were performed on RIE systems. Optical emission spectroscopy was usually employed to serve as the in situ measurements. For inductively coupled plasmas (ICP), a controller based on response surface methodology was designed to control plasma parameters such as species densities, fluxes and energies by employing numerical plasma simulations. The purpose of this study is to demonstrate experimentally the real-time feedback control of plasma density in an ICP. The sensor of the controller was a 36 GHz heterodyne interferometer which measures the line-averaged plasma density. The 13.56 MHz RF power driving the ICP antenna was used as the actuator while the gas pressure was varied to serve as a disturbance causing the plasma density to deviate from the set point. To compensate for the effect of the disturbance, the ICP RF power was varied accordingly. For this proof-of-principle experiment, the PID algorithm was chosen for the controller. A forward controller with a specific trajectory planning was also embedded into the system to smooth out the overshoot and oscillations of electron density when a sudden change of RF power occurs, such as power on or off. The experiment was conducted in an ICP reactor, which used a planar type coil and had a chamber diameter of 40 cm and a height of 20 cm. The feed gas was argon and the flow rate was kept at 15 sccm during the experiment. The heterodyne interferometer was temperature controlled to enhance its stability on phase measurement to within 1°
机译:[[摘要]]仅提供摘要表格。实时反馈控制具有增强VLSI制造过程可靠性的潜力。关于等离子体处理工具的实时反馈控制的大多数研究是在RIE系统上进行的。通常使用光发射光谱法作为原位测量。对于电感耦合等离子体(ICP),设计了一种基于响应表面方法的控制器,以通过使用数值等离子体模拟来控制等离子体参数,例如物种密度,通量和能量。本研究的目的是通过实验证明ICP中等离子体密度的实时反馈控制。控制器的传感器是36 GHz外差式干涉仪,用于测量线平均等离子体密度。驱动ICP天线的13.56 MHz RF功率用作致动器,同时改变气压以作为干扰,使等离子体密度偏离设定值。为了补偿干扰的影响,相应地改变了ICP RF功率。对于本原理验证实验,选择PID算法作为控制器。系统中还嵌入了具有特定轨迹计划的前向控制器,以在发生射频功率突然变化(例如打开或关闭)时消除电子密度的过冲和振荡。该实验是在ICP反应器中进行的,该反应器使用平面型线圈,腔室直径为40 cm,高度为20 cm。进料气体是氩气,并且在实验期间流速保持在15sccm。将外差干涉仪进行温度控制,以将其相位测量稳定性提高到1°以内

著录项

  • 作者

    Chang C.H.;

  • 作者单位
  • 年度 2010
  • 总页数
  • 原文格式 PDF
  • 正文语种 [[iso]]en
  • 中图分类

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