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Low electric field silicon-based THz quantum cascade laser employing L-valley intersubband transitions

机译:采用L谷子带间跃迁的低电场硅基THz量子级联激光器

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摘要

Since their first demonstration in 2002, terahertz (THz) quantum cascade lasers (QCLs) have become established as compact, coherent sources with applications ranging from astrophysics to gas spectroscopy and medical imaging. Every QCL demonstrated to date has been based on III-V heterostructures such as GaAs/AlGaAs, but there are compelling motives for developing Si-based devices. Aside from the possible cost reduction due to the maturity of silicon processing technology, Si may allow higher temperature operation due to its greater thermal conductivity and the absence of polar LO-phonon interactions. Ultimately, CMOS integration and optoelectronic system-on-a-chip applications may be possible. Although the indirect bandgap hinders the development of interband SiGe-based lasers, there is no such obstacle for intersubband transitions in a QCL. Most previous SiGe QCL designs have employed transitions within the valence band, but the lower effective mass of conduction band L-valleys allows higher optical gain. Uniaxial strain effects, which complicate the valence band structure, are also avoided. We show that previous L-valley designs, which probability densities for L-valley subbands in operate at a high electric field, yield high electron the QCL design at an electric field of 4 kV/cm temperatures and relatively low gain. In this paper, we present a bound-to-continuum QCL design operating at much lower electric field. Using a self-consistent (effective mass) Poisson-Schrödinger calculation, with semi-classical rate equation modelling of charge transport, we show that sufficient gain is achievable with our design to overcome the losses in double-metal QCL waveguides.
机译:自2002年首次展示以来,太赫兹(THz)量子级联激光器(QCL)已经成为紧凑,相干的光源,其应用范围从天体物理学到气相色谱法和医学成像。迄今为止,每个已证明的QCL都基于III-V异质结构(例如GaAs / AlGaAs),但是开发基于Si的器件的动机却很诱人。除了由于硅加工技术的成熟而可能降低成本外,由于其更高的导热性和不存在极性LO-声子相互作用,Si可以允许更高的温度工作。最终,CMOS集成和光电片上系统应用可能成为可能。尽管间接带隙阻碍了带间基于SiGe的激光器的发展,但对于QCL中的子带间过渡来说,并没有这样的障碍。以前的大多数SiGe QCL设计都在价带内采用了跃迁,但是导带L谷的有效质量越低,光学增益就越高。也避免了使价带结构复杂化的单轴应变效应。我们表明,以前的L谷设计(在高电场下工作的L谷子带的概率密度)会在4 kV / cm温度和相对较低增益的电场下产生高电子QCL设计。在本文中,我们提出了在较低电场下工作的束缚到连续的QCL设计。使用自洽(有效质量)的Poisson-Schrödinger计算以及电荷传输的半经典速率方程模型,我们证明了使用我们的设计可以实现足够的增益来克服双金属QCL波导中的损耗。

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