The growing demand from industry for high-precision systems introduces new challenges for positioning mechanisms. High accuracy and repeatability downudto the sub-micron scale are not uncommon. This is often combined with extreme environments, like high UV light sources, electron beams or vacuum. Thisudarticle focuses on the flexure mechanism for a largestroke planar XY-positioning system. Applications for such a flexure mechanism can be found in for example lithography, micromachining or microscopy.
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