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Characterization of Slow-Light in a LIL-Fabricated Si3N4 Waveguide Grating

机译:LIL制备的si3N4波导光栅中慢光的表征

摘要

The paper presents results of a study of slow light excitation and power enhancement on a waveguide with a grated section. The 500 periods grating was successfully fabricated by combining a conventional mask lithography step with laser interference lithography. The grating was characterized using both an end-fire and an infrared camera setup to measure respectively the transmission and to map and quantify the power scattered out of the grating. We report an estimated factor for the group velocity slowdown in a finite periodic structure of about 10 times, corresponding to a speed of 0.1c.
机译:本文介绍了在具有光栅截面的波导上进行慢光激发和功率增强的研究结果。通过将传统的掩模光刻步骤与激光干涉光刻相结合,成功地制造了500周期光栅。使用端射和红外摄像机设置来表征光栅,以分别测量透射率并映射和量化散射出光栅的功率。我们报告了在大约10倍的有限周期结构中组速度减慢的估计因子,对应于0.1c的速度。

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