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A Radiation hard bandgap reference circuit in a standard 0.13um CMOS Technology

机译:采用标准0.13um CmOs技术的辐射硬带隙参考电路

摘要

With ongoing CMOS evolution, the gate-oxide thickness steadily decreases, resulting in an increased radiation tolerance of MOS transistors. Combined with special layout techniques, this yields circuits with a high inherent robustness against X-rays and other ionizing radiation. In bandgap voltage references, the dominant radiation-susceptibility is then no longer associated with the MOS transistors, but is dominated by the diodes. This paper gives an analysis of radiation effects in both MOSdevices and diodes and presents a solution to realize a radiation-hard voltage reference circuit in a standard CMOS technology. A demonstrator circuit was implemented in a standard 0.13 m CMOS technology. Measurements show correct operation with supply voltages in the range from 1.4 V down to 0.85 V, a reference voltage of 405 mV 7.5 mV ( = 6mVchip-to-chip statistical spread), and a reference voltage shift of only 1.5 mV (around 0.8%) under irradiation up to 44 Mrad (Si).
机译:随着CMOS的不断发展,栅极氧化物的厚度稳步减小,从而导致MOS晶体管的辐射容限增加。结合特殊的布局技术,可以产生对X射线和其他电离辐射具有高固有鲁棒性的电路。在带隙电压基准中,主要的辐射敏感性不再与MOS晶体管相关联,而是由二极管主导。本文对MOS器件和二极管中的辐射效应进行了分析,并提出了一种在标准CMOS技术中实现辐射硬电压基准电路的解决方案。演示器电路采用标准的0.13 m CMOS技术实现。测量显示电源电压在1.4 V至0.85 V范围内,405 mV 7.5 mV(= 6mV芯片至芯片统计范围)的参考电压以及仅1.5 mV(约0.8%的参考电压漂移)的正确操作)在高达44 Mrad(Si)的辐射下。

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