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Reactive ion etching of low-loss channel waveguides in $Al_2O_3$ and $Y_2O_3$ layers

机译：在$ al_2O_3 $和$ Y_2O_3 $层中对低损耗通道波导进行反应离子蚀刻

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Bradley J.D.B.; Ay F.; Wörhoff K.; Pollnau M.;
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年度 2007
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正文语种 {"code":"en","name":"English","id":9}
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1. Fabrication of low-loss channel waveguides in Al_2O_3 and Y_2O_3 layers by inductively coupled plasma reactive ion etching [J] . J.D.B. BRADLEY, F. AY, K. WOERHOFF, Applied physics . 2007,第2a3期

机译：通过电感耦合等离子体反应离子刻蚀在Al_2O_3和Y_2O_3层中制备低损耗沟道波导
2. Low-loss optical waveguides for the near ultra-violet and visible spectral regions with Al_2O_3 thin films from atomic layer deposition [J] . Mustafa M. Asian, Nathan A. Webster, Courtney L. Byard, Thin Solid Films . 2010,第17期

机译：低损耗光波导，用于来自原子层沉积的具有Al_2O_3薄膜的近紫外和可见光谱区域
3. Loss Reduction of Si Wire Waveguide Fabricated by Edge-Enhancement Writing for Electron Beam Lithography and Reactive Ion Etching Using Double Layered Resist Mask with C_(60) [J] . Keita Inoue, Dhanorm Plumwongrot, Nobuhiko Nishiyama, Japanese journal of applied physics . 2009,第3issue1期

机译：通过使用C_（60）双层抗蚀剂掩模的电子束光刻和反应离子刻蚀的边缘增强写入法制造的Si线波导的损耗降低
4. Ti:sapphire rib channel waveguide fabricated by reactive ion etching of a planar waveguide [C] . A. Crunteanu, G. Jahnchen, R. P. Salathe, Conference on Lasers and Electro-Optics . 2002

机译：Ti：由平面波导的反应离子蚀刻制造的蓝宝石肋沟道波导
5. Optical channel waveguide formation by focused ion beam induced selective mixing and wet chemical etching: Design, fabrication and characterization. [D] . Kumar, Mukesh. 1997

机译：通过聚焦离子束诱导的选择性混合和湿法化学蚀刻形成光通道波导：设计，制造和表征。
6. Low-Loss Optical Waveguides for the Near Ultra-Violet and Visible Spectral Regions with Al2O3 Thin Films from Atomic Layer Deposition [O] . Mustafa M. Aslan, Nathan A. Webster, Courtney L. Byard, -1

机译：用于近紫外线的低损耗光波导和来自原子层沉积的Al2O3薄膜的可见光光波导
7. Optimized deposition and structuring of reactively co-sputtered $AL_2O_3:Er$ waveguide layers with net optical gain [O] . Bradley J.D.B., Geskus D., Blaauwendraat T., 2007

机译：优化的沉积和结构化反应共溅射的$ aL_2O_3：Er $波导层具有净光学增益
8. Effects of Plasma Induced Damage on the Channel Layers of Ion Implanted GaAs MESFETs during Reactive Ion Etching (RIE) and Plasma Ashing Processes. [R] . Ahn, H., Ji, H., Mun, J., 2003

机译：等离子体诱导损伤对离子注入Gaas mEsFET在反应离子刻蚀（RIE）和等离子体灰化过程中通道层的影响。

Reactive ion etching of low-loss channel waveguides in $Al_2O_3$ and $Y_2O_3$ layers

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