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EL2 deep-level transient study in semi-insulating GaAs using positron-lifetime spectroscopy

机译:使用正电子寿命光谱法在半绝缘Gaas中进行EL2深层瞬态研究

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摘要

Positron lifetime measurements performed on Au/GaAs samples at room temperature with an applied square-wave ac bias show a frequency dependent interlace related lifetime intensity that peaks around 0.4 Hz. The observation is explained by the ionization of the deep-donor level EL2 to EL2+ in the GaAs region adjacent to the Au/GaAs interface, causing a transient electric field to be experienced by positrons drifting towards the interface. Without resorting to temperature scanning or any Arrhenius plot the EL2 donor level is found to be located 0.80±0.01±0.05 eV below the conduction-band minimum, where the first error estimate is statistical and the second systematic. The result suggests positron annihilation may, in some instances, act as an alternative to capacitance transient spectroscopies in characterizing deep levels in both semiconductors and semi-insulators.
机译:在室温下对Au / GaAs样品进行正电子寿命测量,并施加方波交流偏置,结果显示频率相关的隔行扫描寿命强度峰值约为0.4 Hz。该观察结果是通过在与Au / GaAs界面相邻的GaAs区域中深施主能级EL2离子化为EL2 +引起的,正电子向界面漂移会引起瞬态电场。在不借助温度扫描或任何阿累尼乌斯曲线的情况下,发现EL2供体水平位于导带最小值以下0.80±0.01±0.05 eV,其中第一个误差估计是统计性的,第二个是系统误差。结果表明,在某些情况下,正电子an灭在表征半导体和半绝缘体中的深能级时可以替代电容瞬态光谱。

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