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Defect study of Zn-doped p-type gallium antimonide using positron lifetime spectroscopy

机译:正电子寿命谱法研究Zn掺杂p型锑化镓的缺陷

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摘要

Defects in p-type Zn-doped liquid-encapsulated Czochralski - grown GaSb were studied by the positron lifetime technique. The lifetime measurements were performed on the as-grown sample at temperature varying from 15 K to 297 K. A positron trapping center having a characteristic lifetime of 317 ps was identified as the neutral VGa-related defect. Its concentration in the as-grown sample was found to be in the range of 1017-1018 cm-3. At an annealing temperature of 300 °C, the VGa-related defect began annealing out and a new defect capable of trapping positrons was formed. This newly formed defect, having a lifetime value of 379 ps, is attributed to a vacancy - Zn-defect complex. This defect started annealing out at a temperature of 580 °C. A positron shallow trap having binding energy and concentration of 75 meV and 1018 cm-3, respectively, was also observed in the as-grown sample. This shallow trap is attributed to positrons forming hydrogenlike Rydberg states with the ionized dopant acceptor Zn.
机译:通过正电子寿命技术研究了p型掺杂锌的液体包裹的切克劳斯基生长的GaSb的缺陷。寿命测量是在15 K至297 K的温度下对生长的样品进行的。特征寿命为317 ps的正电子俘获中心被确定为中性VGa相关缺陷。发现其在成长期样品中的浓度在1017-1018 cm-3的范围内。在300℃的退火温度下,与VGa有关的缺陷开始退火,并形成了一个能够俘获正电子的新缺陷。寿命值为379 ps的这种新形成的缺陷归因于空位-Zn缺陷复合物。该缺陷在580°C的温度下开始退火。在生长的样品中还观察到一个正电子浅陷阱,其结合能和浓度分别为75 meV和1018 cm-3。该浅陷阱归因于正电子与电离的掺杂剂受体Zn形成类似于氢的里德堡态。

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