Inverse lithography technology formulates the photomask synthesis as an inverse mathematical problem. To solve this, we propose a variational functional and develop a robust computational algorithm, where the proposed functional takes into account the process variations and incorporates several regularization terms that can control the mask complexity. We establish the existence of the minimizer of the functional, and in order to optimize it effectively, we adopt an alternating minimization procedure with Chambolle's fast duality projection algorithm. Experimental results show that our proposed algorithm is effective in synthesizing high quality photomasks as compared with existing methods.
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