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Spectroscopie de capacité de diodes Schottky en silicium amorphe hydrogéné et de cellules photovoltaïques à haut rendement à hétérojonctions de silicium

机译:氢化非晶硅中的肖特基二极管容量光谱和具有异质结硅的高效光伏电池

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摘要

In this thesis, research on a-Si:H Schottky diodes and a-Si:H/c-Si heterojunctions is presented with the focus on the capacitance spectroscopy and information on electronic properties that can be derived from this technique. Last years a-Si:H/c-Si heterojunctions (HJ) have received growing attention as an approach which combines wafer and thin film technologies due to their low material consumption and low temperature processing. HJ solar cells benefit from lower fabrication temperatures thus reduced costs, possibilities of large-scale deposition, better temperature coefficient and lower silicon consumption. The most recent record efficiency belongs to Panasonic with 24.7% for a cell of 100 cm² was obtained. The aim of this thesis is to provide a critical study of the capacitance spectroscopy as a technique that can provide information on both subjects: DOS in a-Si:H and band offset values in a-Si:H/c-Si heterojunctions.The first part of the manuscript is devoted to capacitance spectroscopy in a-Si:H Schottky diodes. The interest is concentrated on the simplified treatment of the temperature and frequency dependence of the capacitance that allows one to extract the density of states at the Fermi level in a-Si:H. We focus on the study of the reliability and validity of this approach applied to a-Si:H Schottky barriers with various magnitudes and shapes of the DOS. Several structures representing n-type and undoped hydrogenated amorphous silicon Schottky diodes are modeled with the help of numerical simulation softwares. We show that the reliability of the studied treatment drastically depends on the approximations used to obtain the explicit analytical expression of the capacitance in such an amorphous semiconductor.In the second part of the chapter, we study the possibility of fitting experimental capacitance data by numerical calculations with the input a-Si:H parameters obtained from other experimental techniques. We conclude that the simplified treatment of the experimentally obtained capacitance data together with numerical modeling can be a valuable tool to assess some important parameters of the material if one considers the results of numerical modeling and performs some adjustments. The second part is dedicated to capacitance spectroscopy of a-Si:H/c-Si heterojunctions with special emphasis on the influence of a strong inversion layer in c-Si at the interface. Firstly, we focus on the study of the frequency dependent low temperature range of capacitance-temperature dependencies of a-Si:H/c-Si heterojunctions. The theoretical analysis of the capacitance steps in calculated capacitance-temperature dependencies is presented by means of numerical modeling. It is shown that two steps can occur in the low temperature range, one being attributed to the activation of the response of the gap states in a-Si:H to the small signal modulation, the other one being related to the response of holes in the strong inversion layer in c-Si at the interface. The experimental behavior of C-T curves is discussed. The quasi-static regime of the capacitance is studied as well. We show that the depletion approximation fails to reproduce the experimental data obtained for (p) a-Si:H/(n) c-Si heterojunctions. Due to the existence of the strong inversion layer, the depletion approximation overestimates the potential drop in the depleted region in crystalline silicon and thus underestimates the capacitance and its increase with temperature. A complete analytical calculation of the heterojunction capacitance taking into account the hole inversion layer is developed. It is shown that within the complete analytical approach the inversion layer brings significant changes to the capacitance for large values of the valence band offset. The experimentally obtained C-T curves show a good agreement with the complete analytical calculation and the presence of the inversion layer in the studied samples is thus confirmed.
机译:在本文中,对a-Si:H肖特基二极管和a-Si:H / c-Si异质结的研究以电容光谱学和可从该技术获得的电子性能信息为重点。近年来,a-Si:H / c-Si异质结(HJ)作为一种结合了晶片和薄膜技术的方法因其低材料消耗和低温处理而受到越来越多的关注。 HJ太阳能电池得益于较低的制造温度,从而降低了成本,降低了大规模沉积的可能性,提高了温度系数并降低了硅消耗量。最近的记录效率属于Panasonic,对于100cm²的电池,其效率为24.7%。本文的目的是提供一种对电容光谱学的批判性研究,该技术可以提供有关两个主题的信息:a-Si:H中的DOS和a-Si:H / c-Si异质结中的带偏移值。手稿的第一部分专门介绍a-Si:H肖特基二极管中的电容光谱。兴趣集中在对电容的温度和频率依赖性的简化处理上,这使得人们可以提取a-Si:H中费米能级的状态密度。我们专注于研究此方法应用于不同大小和形状的DOS的a-Si:H肖特基势垒的可靠性和有效性。借助数值模拟软件,对代表n型和未掺杂氢化非晶硅肖特基二极管的几种结构进行了建模。我们证明了所研究处理方法的可靠性在很大程度上取决于用于获得这种非晶半导体中电容的明确解析表达式的近似值。在本章的第二部分中,我们研究了通过数值计算拟合实验电容数据的可能性。输入其他实验技术获得的a-Si:H参数。我们得出的结论是,如果人们考虑了数值建模的结果并进行了一些调整,则对通过实验获得的电容数据的简化处理以及数值建模可以成为评估材料某些重要参数的有价值的工具。第二部分专门研究a-Si:H / c-Si异质结的电容光谱,特别强调界面处c-Si中强反型层的影响。首先,我们专注于a-Si:H / c-Si异质结的电容-温度相关性的频率相关低温范围的研究。通过数值建模,对计算出的电容-温度相关性中的电容阶跃进行了理论分析。结果表明,在低温范围内可以发生两个步骤,一个步骤归因于激活a-Si:H中的隙态对小信号调制的响应,另一步骤与空穴中的响应有关。界面处c-Si中的强反型层。讨论了C-T曲线的实验行为。还研究了电容的准静态状态。我们表明,耗尽近似无法重现(p)a-Si:H /(n)c-Si异质结的实验数据。由于存在强的反型层,因此耗尽近似值高估了晶体硅耗尽层中的电势降,因此低估了电容及其随温度的增加。开发了考虑空穴反型层的异质结电容的完整分析计算。结果表明,在完整的分析方法中,对于较大的价带偏移量而言,反型层会极大地改变电容。实验获得的C-T曲线与完整的分析计算显示出良好的一致性,因此可以确定研究样品中存在反型层。

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    Maslova Olga;

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  • 年度 2013
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  • 正文语种 fr
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