首页> 外文OA文献 >Built-in field control in alloyed c-plane III-N quantum dots and wells
【2h】

Built-in field control in alloyed c-plane III-N quantum dots and wells

机译:合金c面III-N量子点和阱中的内置场控制

摘要

We investigate the degree to which the built-in electric field can be suppressed by employing polarization-matched barriers in III-N quantum well and dot structures grown along the c axis. Our results show that it is possible to take advantage of the opposite contributions to the built-in potential arising from the different possible combinations of wurtzite GaN, InN, and AlN when alloying the materials. We show that, for a fixed bandgap of the dot/well, optimal alloy compositions can be found that minimize the built-in field across the structure. We discuss and study the impact of different material parameters on the results, including the influence of nonlinear effects in the piezoelectric polarization. Structures grown with unstrained barriers and on GaN epilayers are considered, including discussion of the effects of constraints such as strain limits and alloy miscibility. (C) 2011 American Institute of Physics. [doi:10.1063/1.3563568]
机译:我们研究了通过在III-N量子阱中沿极化匹配的势垒和沿c轴生长的点结构可以抑制内置电场的程度。我们的结果表明,当合金化材料时,可能会利用纤锌矿GaN,InN和AlN的不同可能组合对内建电势产生相反的贡献。我们表明,对于点/孔的固定带隙,可以找到最佳合金成分,从而使整个结构的内建场最小。我们讨论和研究不同材料参数对结果的影响,包括压电极化中非线性效应的影响。考虑了无应变势垒且在GaN外延层上生长的结构,包括讨论了诸如应变极限和合金混溶性等约束的影响。 (C)2011美国物理研究所。 [doi:10.1063 / 1.3563568]

著录项

相似文献

  • 外文文献
  • 中文文献
  • 专利

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号