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Transfer-last suspended graphene fabrication on gold, graphite and silicon nanostructures

机译:在金,石墨和硅纳米结构上转移 - 最后悬浮的石墨烯制造

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摘要

While most graphene devices fabricated so far have been by transferring graphene onto flat substrates first, an interesting approach would be to transfer graphene onto patterned substrates to suspend graphene for future graphene nanoelectromechanical device applications. This novel "transfer-last" fabrication is beneficial for reducing possible damage of the suspended graphene caused by subsequent undercutting processes and typical substrate interactions. On the other hand, reduction of contact resistance between graphene and various electrodes, and possible integration with silicon technology are the issues to be investigated. This work focuses on developing the technique to transfer graphene on patterned nanostructures made of gold, nanocrystalline graphite (NCG) and silicon.
机译:尽管到目前为止制造的大多数石墨烯器件都是先将石墨烯转移到平坦的衬底上,但有趣的方法是将石墨烯转移到带图案的衬底上以悬浮石墨烯,以用于将来的石墨烯纳米机电设备应用。这种新颖的“最后转印”制造有利于减少由于后续的底切工艺和典型的基材相互作用而引起的悬浮石墨烯的可能损坏。另一方面,降低石墨烯与各种电极之间的接触电阻以及与硅技术的可能集成是要研究的问题。这项工作的重点是开发在金,纳米晶石墨(NCG)和硅制成的图案化纳米结构上转移石墨烯的技术。

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