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Controlled fabrication of plasmonic nanogaps using electron beam lithography and helium-ion beam milling

机译：使用电子束光刻和氦离子束铣削控制等离子体纳米间隙的制造

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Wang Yudong; Abb Martina; Boden Stuart; de Groot C.H.; Muskens Otto L.;
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年度 2013
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正文语种 {"code":"en","name":"English","id":9}
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1. Fabrication of coaxial plasmonic crystals by focused ion beam milling and electron-beam lithography [J] . Xiaoxiao Jiang, Qiongchan Gu, Fengwen Wang, Materials Letters . 2013,第juna1期

机译：聚焦离子束铣削和电子束光刻技术制造同轴等离子体晶体
2. MicroChannel fabrication via ultraviolet-nanoimprint lithography and electron-beam lithography using an ultraviolet-curable positive-tone electron-beam resist [J] . Microelectronic Engineering . 2020,第Apra期

机译：使用紫外线可固化正性电子束光刻胶，通过紫外-纳米压印光刻和电子束光刻进行微通道制造
3. Sensing properties of infrared nanostructured plasmonic crystals fabricated by electron beam lithography and argon ion milling [J] . Quan Baogang, Liu Zhe, Li Lin, Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures . 2012,第6期

机译：电子束光刻和氩离子铣削制备的红外纳米结构等离子体晶体的传感特性
4. Ultrafine control of partially loaded single plasmonic nanoantennas fabricated using e-beam lithography and helium ion beam milling [C] . Wang Yudong, Abb Martina, Boden Stuart A., Conference on Lasers and Electro-Optics . 2014

机译：使用电子束光刻和氦离子束铣削制造的部分加载的单等离子体纳米天线的超精细控制
5. Fabrication and characterization of nanoelectronic devices for electron beam lithography applications. [D] . Yang, Xiaojing. 2005

机译：用于电子束光刻应用的纳米电子器件的制造和表征。
6. Comparative study of plasmonic antennas fabricated by electron beam and focused ion beam lithography [O] . Michal Horák, Kristýna Bukvišová, Vojtěch Švarc, -1

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7. Comparative study of plasmonic antennas fabricated by electron beam and focused ion beam lithography [O] . Michal Horák, Kristýna Bukvišová, Vojtěch Švarc, 2018

机译：电子束和聚焦离子光束光刻制造的等离子体天线的比较研究
8. Fabrication of Sub-50 nm Finger Spacing and Width High-Speed Metal-Semiconductor-Metal Photodetectors Using High-Resolution Electron Beam Lithography and Molecular Beam Epitaxy [R] . Chou, S. Y., Liu, Y., Fischer, P. B. 1991

机译：利用高分辨率电子束光刻和分子束外延制作亚50nm手指间距和宽度高速金属半导体金属光电探测器

Controlled fabrication of plasmonic nanogaps using electron beam lithography and helium-ion beam milling

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