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Receding contact lines: from sliding drops to immersion lithography

机译:后退接触线:从滑动下降到浸没式光刻

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摘要

Instabilities of receding contact lines often occur through the formation of a corner with a very sharp tip. These dewetting structures also appear in the technology of Immersion Lithography, where water is put between the lens and the silicon wafer to increase the optical resolution. In this paper we aim to compare corners appearing in Immersion Lithography to those at the tail of gravity driven-drops sliding down an incline. We use high speed recordings to measure the dynamic contact angle and the sharpness of the corner, for varying contact line velocity. It is found that these quantities behave very similarly for Immersion Lithography and drops on an incline. In addition, the results agree well with predictions by a lubrication model for cornered contact lines, hinting at a generic structure of dewetting corners.
机译:接触线后退的不稳定性通常是通过形成尖端非常尖的角而发生的。这些去湿结构也出现在浸没式光刻技术中,该技术将水放在透镜和硅晶片之间以提高光学分辨率。在本文中,我们旨在比较浸没式光刻术中出现的拐角与重力驱动液滴沿斜坡向下滑动时出现的拐角。我们使用高速记录来测量动态接触角和拐角的锐度,以改变接触线速度。发现这些量对于浸没式光刻法非常相似,并且在倾斜时下降。此外,结果与润滑模型对弯角接触线的预测非常吻合,暗示了润湿角的通用结构。

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