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Fabrication of silicon 3D photonic crystal structures in 100nm scale using double directional etching method

机译：利用双向刻蚀法制备100nm规模的硅三维光子晶体结构

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Hippo D.; Kawata Y.; Tsuchiya Yoshishige; Mizuta Hiroshi; Oda S.; Urakawa K.; Koshida N.;
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年度 2006
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正文语种 {"code":"en","name":"English","id":9}
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1. Spontaneous emission control of silicon nanocrystals by silicon three-dimensional photonic crystal structure fabricated by self-aligned two-directional electrochemical etching method [J] . Daihei Hippo, Kei Urakawa, Yoshishige Tsuchiya, Materials Chemistry and Physics. . 2009,第1期

机译：自对准双向电化学刻蚀法制备的硅三维光子晶体结构自发控制硅纳米晶体
2. Fabrication of 3D fractal structures using nanoscale anisotropic etching of single crystalline silicon [J] . Erwin J. W. Berenschot, Henri V. Jansen, Niels R. Tas Journal of Micromechanics and Microengineering . 2013,第5期

机译：使用单晶硅的纳米尺度各向异性刻蚀制造3D分形结构
3. Fabrication of high-aspect-ratio double-slot photonic crystal waveguide in InP heterostructure by inductively coupled plasma etching using ultra-low pressure [J] . Kaiyu Cui, Yongzhuo Li, Xue Feng, AIP Advances . 2013,第2期

机译：InP异质结构中高纵横比双缝光子晶体波导的超低压感应耦合等离子体刻蚀
4. Fabrication of silicon 3D photonic crystal structures in 100nm scale using double directional etchings method [C] . Quantum Electronics and Laser Science Conference;Conference on Lasers and Electro-Optics . 2006

机译：使用双向蚀刻方法在100nm刻度中制造硅3D光子晶体结构
5. Development of fabrication processes for silicon and gallium nitride photonic crystal structures. [D] . Yeldandi, Satish. 2008

机译：硅和氮化镓光子晶体结构制造工艺的发展。
6. Silicon-based photonic crystals fabricated using proton beam writing combined with electrochemical etching method [O] . Zhiya Dang, Mark BH Breese, Gonzalo Recio-Sánchez, 2012

机译：质子束写入结合电化学刻蚀法制备的硅基光子晶体
7. Spontaneous emission control of silicon nanocrystals by silicon three-dimensional photonic crystal structure fabricated by self-aligned two-directional electrochemical etching method [O] . Hippo D, Urakawa K, Tsuchiya Yoshishige, 2009

机译：采用自对准双向电化学刻蚀法制备的硅三维光子晶体结构对硅纳米晶的自发发射控制

Fabrication of silicon 3D photonic crystal structures in 100nm scale using double directional etching method

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