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Effect of Fluorine Implantation Dose on Boron Transient Enhanced Diffusion and Boron Thermal Diffusion in Si1-xGex

机译：氟注入剂量对si1-xGex中硼瞬态增强扩散和硼热扩散的影响

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El Mubarek H.A.W.; Karunaratne M.; Bonar J.M.; Dilliway G.D.; Wang Y.; Hemment P.L.F.; Willoughby A.F.; Ashburn P.;
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年度 2005
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1. Effect of Fluorine Implantation Dose on Boron Transient Enhanced Diffusion and Boron Thermal Diffusion in Si{sub}(1-x)Ge{sub}x [J] . H. A. W. El Mubarek, M. Karunaratne, J. M. Bonar, IEEE Transactions on Electron Devices . 2005,第4期

机译：氟注入剂量对Si {sub}（1-x）Ge {sub} x中硼瞬态增强扩散和硼热扩散的影响
2. Suppression of boron transient enhanced diffusion in silicon and silicon germanium by fluorine implantation [J] . El Mubarek HAW, Wang P, Price R, Materials science in semiconductor processing . 2005,第1a3期

机译：通过氟注入抑制硼在硅和硅锗中的瞬态增强扩散
3. Effect of fluorine implantation dose on boron thermal diffusion in silicon [J] . El Mubarek HAW, Bonar JM, Dilliway GD, Journal of Applied Physics . 2004,第8期

机译：氟注入剂量对硼在硅中热扩散的影响
4. BORON-ENHANCED-DIFFUSION OF BORON FROM ULTRA-LOW-ENERGY BORON IMPLANTATION [C] . Aditya Agarwal, D. J. Eaglesham, H.-J. Gossmann, Silicon materials science and technology . 1998

机译：超低能硼注入法对硼的增强扩散作用
5. Physics and modeling of ion implantation induced transient deactivation and diffusion processes in boron doped silicon. [D] . Chakravarthi, Srinivasan. 2001

机译：离子注入引起的硼掺杂硅瞬态失活和扩散过程的物理学和建模。
6. Fast and efficient copper-mediated 18F-fluorination of arylstannanes aryl boronic acids and aryl boronic esters without azeotropic drying [O] . Salla Orvokki Lahdenpohja, Noora Annika Rajala, Johan Rajander, 2019

机译：快速高效的铜介导的18F氟化芳基斯坦酮芳基硼酸和芳基硼酸酯无需共沸干燥
7. Reduction of boron thermal diffusion and elimination of boron transient enhanced diffusion in silicon by high energy fluorine implantation [O] . El Mubarek H A W, Ashburn P 2003

机译：通过高能氟注入减少硼热扩散和消除硼瞬态增强的硅扩散
8. Boron-enhanced diffusion of boron from ultralow-energy boron implantation [R] . Agarwal, A. , Eaglesham, D. J. , Gossmann, H. J. , 1998

机译：从超低能量硼注入中硼增强硼的扩散

Effect of Fluorine Implantation Dose on Boron Transient Enhanced Diffusion and Boron Thermal Diffusion in Si1-xGex

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