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Next Generation of 100-μm-Pitch Wafer-Level Packaging and Assembly for Systems-on-Package

机译:下一代100μm间距晶圆级封装和组装,适用于系统级封装

摘要

According to the latest ITRS roadmap, the pitch of area array packages is expected to decrease to 100 um by 2009. Simultaneously, the electrical performance of these interconnections needs to be improved to support data rates in excess of 10 Gbps, while guaranteeing thermomechanical reliability and lowering the cost. These requirements are challenging, thus, needing innovative interconnection designs and technologies. This paper describes the development of three interconnection schemes for wafer-level packages (WLPs) at 100-um-pitch, involving rigid, compliant, and semicompliant interconnection technologies, extending the state of the art in each. Extensive electrical and mechanical modeling was carried out to optimize the geometry of the interconnections with respect to electrical performance and thermomechanical reliability. It was found that the requirements of electrical performance often conflict with those of thermomechanical reliability and the final “optimum” design is a tradeoff between the two. For the three interconnection schemes proposed, it was found that the electrical requirements can be met fairly well but acceptable mechanical reliability may require organic boards with coefficient of thermal expansion of 10 ppm/K or lower.
机译:根据最新的ITRS路线图,预计到2009年区域阵列封装的间距将减小至100 um。同时,需要改善这些互连的电气性能,以支持超过10 Gbps的数据速率,同时还要保证热机械可靠性和可靠性。降低成本。这些要求具有挑战性,因此需要创新的互连设计和技术。本文介绍了用于100um节距的晶圆级封装(WLP)的三种互连方案的开发,其中涉及刚性,顺应性和半顺应性互连技术,并扩展了每种技术的发展水平。进行了广泛的电气和机械建模,以在电气性能和热机械可靠性方面优化互连的几何形状。结果发现,电气性能的要求经常与热机械可靠性的要求相冲突,最终的“最佳”设计是两者之间的权衡。对于提出的三种互连方案,发现可以很好地满足电气要求,但是可接受的机械可靠性可能需要热膨胀系数为10 ppm / K或更低的有机板。

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