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P‐13: Photosensitivity of Amorphous IGZO TFTs for Active‐Matrix Flat‐Panel Displays

机译:p-13:用于有源矩阵平板显示器的非晶IGZO TFT的光敏性

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摘要

We studied the optical and electrical properties of the amorphous indium gallium zinc oxide thin‐film transistors (a‐IGZO TFTs). To develop a‐IGZO density‐of‐states model, intrinsic a‐IGZO optical properties such as optical band gap and Urbach energy, and TFT characteristics under illumination are investigated. During the a‐IGZO TFTs illumination with the wavelengths ranging from 460 to 660 nm, the off‐state drain current only slightly increases while a large increase was observed for the wavelength below 400 nm. Threshold voltage and subthreshold swing are also only slightly modified between 460 to 660 nm, while field‐effect mobility is almost unchanged in the investigated photon energy range. The observed results are consistent with the a‐IGZO optical energy band gap of about 3.05 eV. This study suggest that the a‐IGZO TFTs are light sensitive above 3.0 eV and photogenerated electrons are more mobile than holes within device channel region.
机译:我们研究了非晶铟镓锌氧化物薄膜晶体管(a-IGZO TFT)的光学和电气特性。为了建立IGZO状态密度模型,研究了固有的a-IGZO光学特性,例如光学带隙和Urbach能量,以及照明下的TFT特性。在波长为460至660 nm的a-IGZO TFT照明期间,截止态漏极电流仅略有增加,而对于400 nm以下的波长则观察到很大的增加。在研究的光子能量范围内,阈值电压和亚阈值摆幅在460至660 nm之间也仅稍作修改,而场效应迁移率几乎不变。观察到的结果与约3.05 eV的a-IGZO光能带隙一致。这项研究表明,a-IGZO TFT在3.0 eV以上对光敏感,并且光生电子比器件沟道区内的空穴更易移动。

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