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Effects of Surface Chemistry on Deposition Kinetics of Colloidal Hematite (α-Fe2O3) in Packed Beds of Silica Sand

机译:表面化学对硅砂填充床中胶体赤铁矿(α-Fe2O3)沉积动力学的影响

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摘要

The removal of colloidal (sub-micrometer) particles from flowing suspensions by deposition on surfaces is important in many natural and industrial processes (e.g., the fateudof colloids and associated pollutants in groundwater systems and water treatment involving separation processes). In deposition, colloidal particles are transported to the vicinity of the collector surface by advection and diffusion. Colloidal interactions atudshort distances determine whether a particle will attach to a collector. Deposition rates are reduced by the presence of repuls4e colloidal interactions. Van der Waals attractionudand electric double layer repulsion are combined in DLVO theory to describe the total interaction energy between two surfaces. The total interaction energy depends on theudsolution chemistry and the electric charge and potential of the interacting surfaces. To understand the attachment step of particle deposition, an understanding of the role ofudsimple chemical changes in the water altering the electrostatic interaction is critical.ududDeposition experiments using hematite particles and a silica sand were conducted to investigate the influence of specific adsorption to hematite on deposition kinetics. Audvariety of electrolytes, both inorganic and organic, were studied (e.g., phosphate, small organic acids, and polymeric organic compounds including fulvic and humic acid). Electrokinetic measurements were carried out, under chemical conditions similar to those in the deposition experiments, to provide information about the sign and magnitude of the surface charge on hematite particles.ududExperimental results show that the deposition rate is influenced primarily by electrostatic interactions, which are determined by the adsorption of potentialuddetennining ions. In the absence of specifically adsorbed species, hematite deposition is transport limited (favorable deposition) at pH 6.5 and 1 millimolar NaCl. The addition of 100 micromolar total phosphate results in unfavorable deposition in which the depositionudrate is reduced by approximately two orders of magnitude. Polymeric organic compounds produce unfavorable deposition at total concentrations around 10^(-5) g/L. It was observed that electrokinetic measurements in the presence of polymeric organic compounds are influenced by the particle concentration when hematite mobility is measured as a function of the total solute concentration. Experimental results indicated that adjusting the total polyelectrolyte concentration by the same factor relating the particle concentrations in the mobility measurements and deposition experiments resulted in matching the hematite surface properties in the mobility measurements to theuddeposition experiments.ududThe experimental collision efficiency for hematite deposition was consistent with deposition under conditions of surface heterogeneity (i.e., the collision efficiencyuddecreased gradually as electrostatic repulsion increased). The natural silica sand used (Ottawa 30) has a high degree of surface roughness and is expected to be chemicallyudheterogeneous.ud
机译:在许多自然和工业过程中(例如,地下水系统中的胶体的命运 udof胶体和相关污染物以及涉及分离过程的水处理),通过在表面上沉积从流动的悬浮液中去除胶体(亚微米级)颗粒非常重要。在沉积过程中,胶体颗粒通过对流和扩散被传输到收集器表面附近。短距离的胶体相互作用决定了粒子是否附着在收集器上。排斥胶体相互作用的存在降低了沉积速率。在DLVO理论中结合了Van der Waals吸引力 udand电双层排斥力来描述两个表面之间的总相互作用能。总相互作用能取决于解溶化学以及相互作用表面的电荷和电势。要了解颗粒沉积的附着步骤,必须了解简单化学变化在水中改变静电相互作用的作用。 ud ud使用赤铁矿颗粒和硅砂进行沉积实验以研究特定吸附的影响对赤铁矿的沉积动力学。研究了各种无机和有机电解质(例如,磷酸盐,小的有机酸以及包括黄腐酸和腐殖酸的聚合有机化合物)。在与沉积实验相似的化学条件下进行了电动测量,以提供有关赤铁矿颗粒表面电荷的符号和大小的信息。 ud ud实验结果表明,沉积速率主要受静电相互作用的影响,这是由潜在的/非确定性离子的吸附确定的。在没有专门吸附的物质的情况下,赤铁矿的沉积在pH 6.5和1毫摩尔NaCl的情况下受到运输限制(有利的沉积)。添加100微摩尔的总磷酸盐会导致不利的沉积,其中沉积 udrate降低约两个数量级。聚合有机化合物在总浓度约为10 ^(-5)g / L时产生不利的沉积。观察到,当测量赤铁矿迁移率作为总溶质浓度的函数时,在聚合物有机化合物存在下的电动测量受到颗粒浓度的影响。实验结果表明,通过与迁移率测量和沉积实验中的颗粒浓度相关的相同因子来调整总聚电解质的浓度,可以使迁移率测量中的赤铁矿表面性质与沉积实验相匹配。 ud ud赤铁矿的实验碰撞效率沉积与表面异质性条件下的沉积一致(即,随着静电排斥力的增加,碰撞效率逐渐降低)。所使用的天然硅砂(渥太华30)具有较高的表面粗糙度,并有望在化学上不均质。

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    Noelte Jeff Lee;

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  • 年度 2002
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