Films of different thickness (50, 100, 150 and 200 nm) were deposited by thermal evaporation in vacuum on two types of substrates glass and ITO. The deposition was performed under a pressure of 10−6 mB with a rate of 0.25 nm/s. Films surface investigations showed morphological and structural changes in function of films thickness and the nature of the substrate. Films optical transmission was analysed in the 280–1600 nm spectral range and the electrical measurements were done in low vacuum (10−1:10−2 mB) and in dark.
展开▼
