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Effect of the morphology on the optical and electrical properties of TPyP thin films deposited by vacuum evaporation

机译:形貌对真空蒸发沉积Tpyp薄膜光学和电学性能的影响

摘要

We have studied the effect of the morphology on the optical and electrical properties of the TPyP thin films deposited by vacuum evaporation on different substrates (Si with different characteristics, ITO, quartz and glass). The presence of some well-defined B and Q absorption bands has been evidenced. FTIR and photoluminescence measurements have been used to confirm the preservation of the chemical structure of the compound during the evaporation process. The contact Au/TPyP/Si(n) is rectifier, while a blocking behavior has been shown by Si(n)/TPyP/Si(n) and ITO/TPyP/Si(n) and an injector dominated behavior by Si(p)/TPyP/Si(p) and ITO/TPyP/Si(p) heterostructures. The best transmission was obtained on TPyP film deposited on ITO and the highest value of the current in heterostructures Si(n) electrode characterised by a large grain morphology and in consequence by a weak optical and charge carrier scattering at the grain boundaries.
机译:我们已经研究了形态对真空蒸发沉积在不同衬底(具有不同特性的Si,ITO,石英和玻璃)上的TPyP薄膜的光学和电学性质的影响。已经证实存在一些明确的B和Q吸收带。 FTIR和光致发光测量已用于确认化合物在蒸发过程中的化学结构得以保留。触点Au / TPyP / Si(n)是整流器,而Si(n)/ TPyP / Si(n)和ITO / TPyP / Si(n)则显示出阻塞行为,而Si(p )/ TPyP / Si(p)和ITO / TPyP / Si(p)异质结构。在ITO上沉积的TPyP膜上获得了最佳的透射率,异质结构Si(n)电极中的电流最高,其特征是晶粒形态大,结果是在晶界处的光学和载流子散射较弱。

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