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Influence of electron irradiation on optical properties of ZnSe thin films

机译:电子辐照对Znse薄膜光学性质的影响

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摘要

Zinc Selenide (ZnSe) thin films of 500 nm thickness were deposited by electron beam evaporation technique and irradiated with 8 MeV electron beam for the doses ranging from 0 Gy to 1 kGy. Optical properties were studied for both irradiated and pristine samples using Ultraviolet-Visible spectrophotometer. The increase in electron dose tends to decrease in transmittance and increase in refractive index of thin film. Irradiated thin film exhibits minimum of 67 transmittance for 800 Gy with very high absorption of optical energy at 550 nm wavelength. The samples irradiated > 800 Gy tends to redeem the pristine properties. Optical band gap for irradiated thin film were direct and in the range of 2.66 - 2.69 eV. © 2014 Sumy State University.
机译:通过电子束蒸发技术沉积厚度为500 nm的硒化锌(ZnSe)薄膜,并以8 MeV电子束辐照,剂量范围为0 Gy至1 kGy。使用紫外可见分光光度计研究了辐照样品和原始样品的光学性能。电子剂量的增加趋于降低透射率并增加薄膜的折射率。辐照的薄膜在800 Gy波长下的最小透射率为67,在550 nm波长处的光能吸收率很高。辐射> 800 Gy的样品倾向于赎回原始特性。辐照薄膜的光学带隙是直接的,范围在2.66-2.69 eV之间。 ©2014苏梅州立大学。

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