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Formation and Characteristics of the Low Dielectric Carbon Doped Silicon Oxide Thin Film Deposited by MTMS/O2 – ICPCVD

机译：mTms / O2 - ICpCVD沉积低介电碳掺杂氧化硅薄膜的形成与特性

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Chang Sil Yang; Heon Ju Lee; Chi Kyu Choi;
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1. Formation and Characteristics of the Low Dielectric Carbon Doped Silicon Oxide Thin Film Deposited by MTMS/O2 - ICPCVD [J] . Chang Sil Yang, Heon Ju Lee, Chi Kyu Choi Diffusion and Defect Data. Solid State Data, Part B. Solid State Phenomena . 2005,第0期

机译：MTMS / O2-ICPCVD沉积低介电碳掺杂氧化硅薄膜的形成及其特性。
2. Temperature accelerated dielectric breakdown of PECVD low-k carbon doped silicon dioxide dielectric thin films [J] . H. ZHOU, F.G. SHI, B. ZHAO, Applied Physics. A, Materials Science & Processing . 2005,第4期

机译：PECVD低k碳掺杂二氧化硅介电薄膜的温度加速介电击穿
3. Effect of deposition methods on dielectric breakdown strength of PECVD low-k carbon doped silicon dioxide dielectric thin films [J] . H. Zhou, F.G. Shi, B. Zhao, Microelectronics journal . 2004,第7期

机译：沉积方法对PECVD低k碳掺杂二氧化硅介电薄膜介电击穿强度的影响
4. Formation and Characteristics of the Low Dielectric Carbon Doped Silicon Oxide Thin Film Deposited by MTMS/O{sub}2 - ICPCVD [C] . Chang Sil Yang, Heon Ju Lee, Chi Kyu Choi Conference on PIM and ASIP . 2005

机译：MTMS / O} 2 - ICPCVD沉积的低介电碳掺杂氧化硅氧化硅氧化膜的形成和特征
5. Enhanced mechanical performance of low dielectric constant thin films synthesized in supercritical carbon dioxide, and SANS studies of microemulsions induced or destabilized by compressed carbon dioxide [D] . Romang, Alvin Horatio 2012

机译：超临界二氧化碳中合成的低介电常数薄膜的增强的机械性能，以及压缩二氧化碳诱导或破坏的微乳液的SANS研究
6. Undoped and Nickel-Doped Zinc Oxide Thin Films Deposited by Dip Coating and Ultrasonic Spray Pyrolysis Methods for Propane and Carbon Monoxide Sensing Applications [O] . Tangirala Venkata Krishna Karthik, María de la Luz Olvera, Arturo Maldonado, 2020

机译：通过浸涂和超声波喷雾热解方法沉积的未掺杂和镍掺杂的氧化锌薄膜用于丙烷和一氧化碳传感应用
7. Low-Temperature Growth of N-doped SiO2Layer Using Inductively-Coupled Plasma Oxidation and Its Effect on the Characteristics of Thin Film Transistors [O] . Bo-Hyun Kim, Seung-Ryul Lee, Kyung-Min Ahn, 2009

机译：使用电感耦合等离子体氧化的N掺杂SiO2晶体的低温生长及其对薄膜晶体管特性的影响
8. Silicon Oxidation Studies: A Review of Recent Studies on Thin Film Silicon Dioxide Formation in The Physics and Chemistry of SiO2 and the Si-SiO2 Interface [R] . Irene, E. A. 1988

机译：硅氧化研究：siO2和si-siO2界面物理和化学中薄膜二氧化硅形成的最新研究综述

Formation and Characteristics of the Low Dielectric Carbon Doped Silicon Oxide Thin Film Deposited by MTMS/O2 – ICPCVD

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