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Characterization of Ion Beam Deposited 107Ag Thin Films on Si(111) Surface by means of Rutherford Backscattering Spectroscopy and Reflection High Energy Electron Diffraction

机译：利用卢瑟福背散射光谱和反射高能电子衍射表征离子束在si（111）表面沉积107ag薄膜

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Takahiro Asai; Masanori Takeuchi; Akihiro Urano; Yasushi Kobayashi; Yuuichi Fukuda; Junji Yuhara Takanori Nagasaki;
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Characterization of Ion Beam Deposited 107Ag Thin Films on Si(111) Surface by means of Rutherford Backscattering Spectroscopy and Reflection High Energy Electron Diffraction

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