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Effect of two-step pretreatment on cobalt contents and surface roughness of tungsten carbide substrate prior to diamond coating

机译:两步预处理对金刚石涂层前碳化钨基材钴含量和表面粗糙度的影响

摘要

Cemented tungsten carbide is the most widely used material for cutting tools. Due to extreme demands higher tool life several types of coating have been introduced to prolong the service time which include diamond coating. However cobalt binder in tungsten carbide prevents diamond to adhere well on the substrate and its content at the outer surface should be reduce to below 1%. Single step and two-step pretreatments have been studied by many researchers. But to date poor adhesion of diamond coating still an issue. In this work a two-step pretreatment was used to etch tungsten carbide with 6% cobalt (WC-6% Co) at the surface of the substrate in order to solve poor adhesion problem. First step with Murakami's reagent (2, 3, 6, and 20 minutes) and the second step of the process were carried out by etching in a solution of hydrochloric acid (30, 45, and 60 seconds) or a solution of sulfuric acid (10 seconds). The effect of them on Co cemented tungsten carbide samples in term of surface morphology, surface roughness, and cobalt removal from the surface were examined. It is found the longer Murakami etching time produces a slightly rougher surface than the shorter exposing time. Both acid solutions were used in the second pretreatment step able to reduce cobalt content to below 1% at all conditions regardless of etching time. The best combination of pretreatment process is 20 minutes Murakami etching and 45 seconds exposure time of hydrochloric acid that yields the higher surface roughness and the lowest cobalt content on the substrate surface.
机译:硬质合金碳化钨是最广泛用于切削工具的材料。由于对工具寿命的更高要求,已经引入了几种涂层来延长使用寿命,其中包括金刚石涂层。但是,碳化钨中的钴粘合剂会阻止金刚石很好地粘附在基材上,并且其外表面的含量应降低至1%以下。许多研究者已经研究了单步和两步预处理。但是迄今为止,金刚石涂层的附着力差仍然是一个问题。在这项工作中,为了解决较差的粘附性问题,使用了两步预处理来蚀刻衬底表面具有6%钴(WC-6%Co)的碳化钨。村上试剂的第一步(2、3、6和20分钟)和第二步是通过在盐酸溶液(30、45和60秒)或硫酸溶液( 10秒)。从表面形态,表面粗糙度和从表面去除钴的角度,研究了它们对Co硬质合金碳化钨样品的影响。已经发现,与较短的曝光时间相比,较长的村上蚀刻时间产生的表面稍粗糙。两种酸溶液均用于第二预处理步骤,无论蚀刻时间如何,均能够在所有条件下将钴含量降至1%以下。预处理过程的最佳组合是20分钟的村上蚀刻和45秒的盐酸暴露时间,从而在基材表面产生更高的表面粗糙度和最低的钴含量。

著录项

  • 作者

    Safari Habiballah;

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  • 年度 2010
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  • 原文格式 PDF
  • 正文语种 {"code":"en","name":"English","id":9}
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