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Modeling the schottky barrier properties of graphene nanoribbon schottky diode

机译:建模石墨烯纳米带肖特基二极管的肖特基势垒特性

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摘要

The increasing demand for small sized, low power consumption and high processing speeds have always been the pillars of transistor development. To meet the demands of the transistor, the current trend is to reduce the size of Metal Oxide Semiconductor Field Effect Transistor (MOSFET) into nanoscale regime because size plays an essential role in the performance of transistors. However, the extreme scaling of the size has brought new challenges as the MOSFET reaches its performance limit. In this respect, the Graphene Nanoribbon (GNR), a promising material that holds much potential for the future nanoelectronic devices, is introduced as a new material to overcome the limitation that exists in the conventional MOSFET. In this research, the analytical model of the GNR Schottky diode was presented to analyse the behaviour of metal-GNR interface. The work presents a simple model to analyse the current-voltage characteristic in the function of Schottky barrier properties such as the potential barrier and the Schottky barrier lowering effect of GNR contact. By using the analytical method, the analytical model for depletion region width, potential barrier, Schottky barrier lowering effect and the current-voltage characteristics of the GNR Schottky diode were presented. Besides that, the device structure of the GNR Schottky diode was built using Atomic Toolkit Virtual Nano Lab software to analyse the edge effect of metal-GNR interface. Based on the results, it is found that the potential barrier of GNR contacts is lower than conventional silicon contacts by at least half of it and the metal-Zigzag GNR interface shows promising potential to become interconnect as the interface is able to carry high current density up to 109 A/cm2. In addition, the proposed current-voltage characteristics model of GNR Schottky diode shows good agreement with experimental data and also with ATK Tools Simulation result.
机译:对小尺寸,低功耗和高处理速度的日益增长的需求一直是晶体管发展的支柱。为了满足晶体管的需求,当前的趋势是将金属氧化物半导体场效应晶体管(MOSFET)的尺寸减小到纳米级,因为尺寸在晶体管的性能中起着至关重要的作用。但是,随着MOSFET达到其性能极限,尺寸的极端缩放带来了新的挑战。在这方面,石墨烯纳米带(GNR)是一种有前途的材料,它为未来的纳米电子器件具有很大的潜力,被引入作为一种新材料来克服常规MOSFET中存在的局限性。在这项研究中,提出了GNR肖特基二极管的分析模型来分析金属-GNR界面的行为。这项工作提出了一个简单的模型来分析肖特基势垒特性(如势垒和GNR接触的肖特基势垒降低效应)中的电流-电压特性。通过分析方法,建立了GNR肖特基二极管的耗尽区宽度,势垒,肖特基势垒降低效应和电流-电压特性的解析模型。除此之外,还使用Atomic Toolkit Virtual Nano Lab软件构建了GNR肖特基二极管的器件结构,以分析金属-GNR接口的边缘效应。根据结果​​,发现GNR触点的势垒比传统的硅触点低至少一半,并且金属-之字形GNR界面显示出有望成为互连的潜力,因为该界面能够承载高电流密度最高109 A / cm2。此外,所提出的GNR肖特基二极管的电流-电压特性模型与实验数据以及ATK工具仿真结果显示出良好的一致性。

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    Wong King Kiat;

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  • 年度 2014
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