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Cost of Ownership Analysis for Patterning Using Step and Flash Imprint Lithography

机译：使用步进和闪存压印光刻图案化的所有权成本分析

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S. V. Sreenivasan; C. G. Willson; N. E. Schumaker; D. J. Resnick;
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年度 2015
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1. Patterned wafer defect density analysis of step and flash imprint lithography [J] . I. McMackin, W. Martin, J. Perez, Journal of Vacuum Science & Technology. B, Microelectronics and Nanometer Structures . 2008,第1期

机译：分步和快速压印光刻的图案化晶圆缺陷密度分析
2. Step and flash imprint lithography for manufacturing patterned media [J] . Gerard M. Schmid, Mike Miller, Cynthia Brooks, Journal of Vacuum Science & Technology . 2009,第2期

机译：分步和快速压印光刻技术，用于制造图案化介质
3. Step-and-flash imprint lithography for patterning interconnect dielectrics [J] . Frank Palmieri, Michael Stewart, Kane Jen, Solid state technology . 2007,第9期

机译：步进闪光压印光刻技术，用于对互连电介质进行构图
4. Cost of Ownership Analysis for Patterning Using Step and Flash Imprint Lithography [C] . S.V. Sreenivasan, C.G. Willson, N.E. Schumaker, Society of Photo-Optical Instrumentation Engineers Conference on Emerging Lithographic Technologies . 2002

机译：使用步骤和闪光印记光刻图案化的所有权分析成本
5. Cost-Effective Imprint Template Fabrication for Step and Flash Imprint Lithography. [D] . Munder, Adam. 2011

机译：具有成本效益的压印模板制造，用于分步和快速压印光刻。
6. Single Layer Broadband Anti-Reflective Coatings for Plastic Substrates Produced by Full Wafer and Roll-to-Roll Step-and-Flash Nano-Imprint Lithography [O] . Marieke Burghoorn, Dorrit Roosen-Melsen, Joris de Riet, 2013

机译：通过全晶圆和卷对卷分步闪光纳米压印光刻技术生产的塑料基板单层宽带抗反射涂层
7. Evaluation of the Imprio 100 Step and Flash Imprint Lithography Tool [O] . 2015

机译：评估Imprio 100步骤和闪存压印光刻工具

Cost of Ownership Analysis for Patterning Using Step and Flash Imprint Lithography

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