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Influence of Microwave Power on the Properties of Hydrogenated Diamond-Like Carbon Films Prepared by ECR Plasma Enhanced DC Magnetron Sputtering∗

机译：微波功率对ECR等离子体增强直流磁控溅射制备氢化类金刚石薄膜性能的影响*

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Ru Lili (汝丽丽; Huang Jianjun (黄建军; Gao Liang (高亮; Qi Bing (齐冰;
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1. Influence of microwave power on the properties of hydrogenated diamond-like carbon films prepared by ECR plasma enhanced DC magnetron sputtering [J] . Ru L., Huang J., Gao L., Plasma Science & Technology . 2010,第5期

机译：微波功率对ECR等离子体增强直流磁控溅射制备的类金刚石氢化碳膜性能的影响
2. Influence of Microwave Power on the Properties of Hydrogenated Diamond-Like Carbon Films Prepared by ECR Plasma Enhanced DC Magnetron Sputtering [J] . RU Lili, HUANG Jianjun, GAO Liang, 等离子体科学和技术：英文版 . 2010,第005期

机译：微波功率对ECR等离子增强直流磁控溅射制备的类金刚石氢化碳膜性能的影响
3. Influence of Microwave Power on the Properties of Hydrogenated Diamond-Like Carbon Films Prepared by ECR Plasma Enhanced DC Magnetron Sputtering [J] . RU Lili, HUANG Jianjun, GAO Liang, 等离子体科学和技术（英文版） . 2010,第005期
4. Chemical Structure of Carbon Nitride Films Prepared by MW-ECR Plasma Enhanced Magnetron Sputtering [C] . XU Jun, GAO Peng, DING Wan-yu, International Federation for Heat Treatment and Surface Engineering Congress vol.2; 20041026-28; Shanghai(CN) . 2004

机译：MW-ECR等离子增强磁控溅射制备氮化碳膜的化学结构
5. Investigation of the film properties and deposition process of hydrogenated amorphous carbon films deposited with a microwave ECR plasma reactor. [D] . Kim, Bo Keun. 2000

机译：用微波ECR等离子体反应器沉积氢化非晶碳膜的膜性能和沉积过程的研究。
6. The Effects of Precursor C2H2 Fraction on Microstructure and Properties of Amorphous Carbon Composite Films Containing Si and Ag Prepared by Magnetron Sputtering Deposition [O] . Xiaoqiang Liu, Junying Hao, Yongjun Lv, 2019

机译：前驱体C2H2分数对磁控溅射沉积制备的含Si和Ag的非晶碳复合膜的组织和性能的影响
7. Chemical structure and physical properties of diamond-like amorphous carbon films prepared by magnetron sputtering [O] . N-H. Cho, K. M. Krishnan, D. K. Veirs, 1990

机译：磁控溅射制备的金刚石非晶碳膜的化学结构和物理性质

Influence of Microwave Power on the Properties of Hydrogenated Diamond-Like Carbon Films Prepared by ECR Plasma Enhanced DC Magnetron Sputtering∗

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