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Accelerated lifetime metrology of EUV multilayer mirrors in hydrocarbon environments

机译：在烃类环境中EUV多层反射镜的加速寿命计量

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S. B. Hill*a; N. S. Faradzheva; C. Tarrioa; T. B. Lucatortoa; T. E. Madeyb; B. V. Yakshinskiyb; S. Yulinc;
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1. Metrology of Mo/Si multilayer mirrors at 13.5 nm with the use of a laser-produced plasma extreme ultraviolet (EUV) source based on a gas puff target [J] . Rakowski R, Bartnik A, Fiedorowicz H, Optica applicata . 2006,第4期

机译：Mo / Si多层镜在13.5 nm的计量，该激光使用了基于气团靶的激光产生等离子体超紫外线（EUV）源
2. Metrology of Mo/Si multilayer mirrors at 13.5 nm with the use of a laser-produced plasma extreme ultraviolet (EUV) source based on a gas puff target [J] . A. BARTNIK, H. FIEDOROWICZ, H. TICHA, Optica applicata . 2006,第4期

机译：Mo / Si多层镜在13.5 nm的计量，该激光使用了基于气团靶的激光产生等离子体超紫外线（EUV）源
3. EUV multilayer mirrors in solar X-EUV Imager [J] . Wang Haifeng, Wang Xiaodong, Chen Bo, Optik: Zeitschrift fur Licht- und Elektronenoptik: = Journal for Light-and Electronoptic . 2020,第期

机译：太阳能X-EUV成像仪中的EUV多层镜子
4. Accelerated lifetime metrology of EUV multilayer mirrors in hydrocarbon environments [C] . S. B. Hill, N. S. Faradzhev, C. Tarrio, Conference on Emerging Lithographic Technologies . 2008

机译：碳氢化合物环境中EUV多层反射镜的加速寿命计量
5. Optical constants of materials in the EUV/soft x-ray region for multilayer mirror applications. [D] . Soufli, Regina. 1997

机译：用于多层反射镜的EUV /软X射线区域中材料的光学常数。
6. Experimental study of EUV mirror radiation damage resistance under long-term free-electron laser exposures below the single-shot damage threshold [O] . Igor A. Makhotkin, Ryszard Sobierajski, Jaromir Chalupský, -1

机译：在单次损伤阈值以下的长期自由电子激光照射下EUV镜辐射损伤抵抗性的实验研究
7. Accelerated lifetime metrology of EUV multilayer mirrors in hydrocarbon environments [O] . Hill S.B., Faradzhev N.S., Tarrio C., 2008

机译：在烃类环境中EUV多层反射镜的加速寿命计量
8. EUV metrology of multilayer optics [R] . Ray-Chaudhuri, A. K. , Stulen, R. H. , Ng, W. , 1994

机译：EUV多层光学计量学

Accelerated lifetime metrology of EUV multilayer mirrors in hydrocarbon environments

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