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Measurement and Control of Airborne Molecular Contamination During Wafer Storage and Transport

机译：晶圆储存和运输过程中气载分子污染的测量与控制

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Daniel Alvarez; Allan Tram; Russell J. Holmes;
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年度 2015
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1. Measurement and Control of Airborne Molecular Contamination During Wafer Storage and Transport [J] . Daniel Alvarez Jr, Allan Tram, Russell J. Holmes Diffusion and Defect Data. Solid State Data, Part B. Solid State Phenomena . 2005,第0期

机译：晶圆储存和运输过程中空气中分子污染的测量和控制
2. Development of a Storage Getter Test for Cu Contaminations in Silicon Wafers Based on ToF-SIMS Measurements [J] . D. Kot, G. Kissinger, A. Sattler, Acta Physica Polonica . 2014,第4期

机译：基于ToF-SIMS测量的硅晶片中Cu污染的吸气剂测试开发。
3. Reduction of Airborne Molecular Contamination on 300 mm FrontOpening Unified POD (FOUP) and Wafers Surface by VacuumTechnology [J] . Philippe MAQUIN, Hisanori KAMBARAa Diffusion and Defect Data. Solid State Data, Part B. Solid State Phenomena . 2009,第Null期

机译：通过真空技术减少300毫米FrontOpening统一POD（FOUP）和晶圆表面上的空气传播分子污染
4. Measurement and Control of Airborne Molecular Contamination During Wafer Storage and Transport [C] . Daniel Alvarez Jr, Allan Tram, Russell J. Holmes, International Symposium on Ultra Clean Processing of Silicon Surfaces . 2005

机译：晶圆储存和运输过程中空气污染的测量与控制
5. Modeling of generation and transport of particles in low pressure glow discharges and contamination of wafers. [D] . Choi, Seung Jin. 1993

机译：对低压辉光放电和晶圆污染中粒子的产生和传输进行建模。
6. Geltape method for measurement of work related surface contamination with cobalt containing dust: correlation between surface contamination and airborne exposure. [O] . O M Poulsen, E Olsen, J M Christensen, 1995

机译：用于测量与工作相关的含钴粉尘的表面污染的凝胶胶带方法：表面污染与空气传播的暴露之间的相关性。
7. Wafer Container Monitoring Concerning Airborne Molecular Contaminations along a 300 mm Power Semiconductor Production Flow [O] . Peter Franze, Germar Schneider, Stefan Kaskel 2021

机译：沿着300 mm功率半导体生产流程的空气传播分子污染的晶圆集装箱监测

Measurement and Control of Airborne Molecular Contamination During Wafer Storage and Transport

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