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Process variation aware OPC with variational lithography modeling

机译：具有变分光刻建模的工艺变化感知OpC

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Peng Yu; Sean X. Shi; David Z. Pan;
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年度 2006
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2. A Fast and Accurate Process Variation-Aware Modeling Technique for Resistive Bridge Defects [J] . Zhong S., Khursheed S., Al-Hashimi B. M. Computer-Aided Design of Integrated Circuits and Systems, IEEE Transactions on . 2011,第11期

机译：一种快速准确的电阻桥缺陷过程变化感知建模技术
3. Process Variation in Embedded Memories: Failure Analysis and Variation Aware Architecture [J] . Amit Agarwal, Bipul C. Paul, Saibal Mukhopadhyay, IEEE Journal of Solid-State Circuits . 2005,第9期

机译：嵌入式内存中的过程变化：故障分析和变化感知架构
4. Process variation aware OPC with variational lithography modeling [C] . Peng Yu, Sean X. Shi, David Z. Pan, Annual conference on Design automation;Conference on Design automation . 2006

机译：具有变版光刻建模的可识别过程变化的OPC
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6. Cross-linguistic variation in the neurophysiological response to semantic processing: Evidence from anomalies at the borderline of awareness [O] . Sarah Tune, Matthias Schlesewsky, Steven L. Small, -1

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7. A Fast Mask Manufacturability and Process Variation Aware OPC Algorithm with Exploiting a Novel Intensity Estimation Model [O] . Ahmed AWAD, Atsushi TAKAHASHI, Chikaaki KODAMA 2016

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