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Across-wafer CD Uniformity Control Through Lithography and Etch Process: Experimental Verification

机译：通过光刻和蚀刻工艺进行跨晶圆CD均匀性控制：实验验证

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Qiaolin(charlie Zhang; Cherry Tang; Jason Cain; Angela Hui; Tony Hsieh; Nick Maccrae;
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年度 2015
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1. One step forward from run-to-run critical dimension control: Across-wafer level critical dimension control through lithography and etch process [J] . Zhang QL, Poolla K, Spanos CJ Journal of Process Control . 2008,第10期

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2. Evolution of across-wafer uniformity control in plasma etch [J] . Hwang Stephen, Kanarik Keren Solid state technology . 2016,第5期

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3. Integrated bake/chill system for across-wafer temperature uniformity control in photoresist processing [J] . Hui Tong Chua, Arthur Tay, Yuheng Wang Journal of Vacuum Science & Technology . 2009,第3期

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4. Across-wafer CD Uniformity Control Through Lithography and Etch Process: Experimental Verification [C] . Qiaolin(Charlie) Zhang, Cherry Tang, Jason Cain, Metrology, Inspection, and Process Control for Microlithography XXI pt.2; Proceedings of SPIE-The International Society for Optical Engineering; vol.6518 pt.2 . 2006

机译：通过光刻和蚀刻工艺控制跨晶圆CD的均匀性：实验验证
5. Mechanisms and development of etch resistance for highly aromatic monomolecular etch masks: Towards molecular lithography. [D] . Jarvholm, Erik Jonas. 2007

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6. Closed-Form Solution and Experimental Verification for the Axisymmetric Deformation Problem of Blistering Circular Thin Polymer Films under Uniformly Distributed Gas Pressure [O] . Zhi-Xin Yang, Xiao-Ting He, Si-Rui Wen 2020

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7. Across-wafer CD Uniformity Enhancement through Control of Multi-zone PEB Profiles [O] . Qiaolin Zhang *a, Paul Friedberg B, Cherry Tang C, 2008

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8. Real Time Control and Experimental Verification of Semiconductor Processing [R] . Tsakallis, K., Kozicki, M. 1997

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Across-wafer CD Uniformity Control Through Lithography and Etch Process: Experimental Verification

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