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Efficient Electron Beam Deposition for Repetitively Pulsed Krypton Fluoride Lasers

机译：重复脉冲氪氟化物激光器的高效电子束沉积

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1. EFFICIENT ELECTRON BEAM PUMPING OF REPETITIVELY PULSED, HIGH ENERGY KRYPTON FLUORIDE LASERS [J] . F. Hegeler, M.C. Myers, J.D. Sethian, Fusion Science and Technology . 2003,第Sup期

机译：高效脉冲，高能Krypton氟化物激光的高效电子束泵浦
2. Efficient repetitively pulsed 730 joule electron beam pumped KrF laser [J] . Wolford MF, Hegeler F, Myers MC, Journal de Physique, IV: Proceedings of International Conference . 2006,第0期

机译：高效重复脉冲730焦耳电子束泵浦KrF激光器
3. Formation of the active medium in high-power repetitively pulsed gas lasers pumped by an electron-beam-controlled discharge [J] . Bulaev V. D., Lysenko S. L. Quantum electronics . 2015,第7期

机译：电子束控制放电泵浦的高功率重复脉冲气体激光器中活性介质的形成
4. Efficient Electron Beam Deposition for Repetitively Pulsed Krypton Fluoride Lasers [C] . F. Hegeler, M. C. Myers, M. Friedman, 14th International Conference on High-Power Particle Beams Jun 23-28, 2002 Albuquerque, New Mexico . 2002

机译：重复脉冲氟化Fluor激光器的有效电子束沉积
5. Pulsed laser deposition and thin film properties of p-type barium copper sulfur fluoride, barium copper selenium fluoride, barium copper tellurium fluoride and n-type zinc indium oxide wide band-gap semiconductors. [D] . Kykyneshi, Robert. 2008

机译：p型氟化钡铜，氟化钡铜硒，氟化钡铜碲和n型氧化锌铟宽带隙半导体的脉冲激光沉积和薄膜特性。
6. Chemical Structure of EVA Films Obtained by Pulsed Electron Beam and Pulse Laser Ablation [O] . Agata Niemczyk, Dariusz Moszyński, Roman Jędrzejewski, 2019

机译：脉冲电子束和脉冲激光烧蚀获得的EVA膜的化学结构
7. Design and operation of a 45 μs repetitively pulsed 12 mw electron beam for a CO₂ laser [O] . Curry Randy D. 1992

机译：用于CO 2激光器的45μs重复脉冲12 mw电子束的设计和操作
8. Efficient Electron Beam Deposition for Repetitively Pulsed Krypton Fluoride Lasers. [R] . Hegeler, F., Meyers, M. C., Friedman, M., 2002

机译：重复脉冲氪氟化物激光器的高效电子束沉积。

Efficient Electron Beam Deposition for Repetitively Pulsed Krypton Fluoride Lasers

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