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Preparation and Conductive Properties of Ag Thin Film by DC Magnetron Sputtering Method

机译：直流磁控溅射法制备ag薄膜及其导电性能

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Jianguang Lin A; Weixiang Weng B; Weihui Huang C; Haifang Zhou D;
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1. Properties of transparent conductive boron-doped ZnO thin films deposited by pulsed DC magnetron sputtering from Zn_(1-x)B_xO targets [J] . B.Wen, C.Q.Liu, N.Wang, Applied Physics . 2017,第3期

机译：脉冲直流磁控溅射从Zn_（1-x）B_xO靶沉积的透明导电硼掺杂ZnO薄膜的性能
2. Structure and Properties of Al-Doped ZnO Transparent Conductive Thin-Films Prepared by Asymmetric Bipolar Pulsed DC Reactive Magnetron Sputtering [J] . Fu-Yung Hsu, Tse-Hao Chen, Kun-Cheng Peng Journal of nanoscience and nanotechnology . 2009,第7期

机译：非对称双极性脉冲直流反应磁控溅射制备Al掺杂ZnO透明导电薄膜的结构与性能
3. Electrical and optical properties of molybdenum-doped ZnO transparent conductive thin films prepared by dc reactive magnetron sputtering [J] . Chenguo Wu, Jie Shen, Jin Ma, Semiconductor science and technology . 2009,第12期

机译：直流反应磁控溅射制备钼掺杂ZnO透明导电薄膜的电学和光学性质
4. Preparation and Conductive Properties of Ag Thin Film by DC Magnetron Sputtering Method [C] . Jianguang Lin, Weixiang Weng, Weihui Huang, International Conference on Advanced Design and Manufacturing Engineering . 2012

机译：直流磁控溅射法的Ag薄膜制备和导电性能
5. Preparation, characterization and post-deposition modification of pulsed-dc magnetron sputtered Vanadium Oxide thin films for microbolometer applications [D] . Venkatasubramanian, Chandrasekaran 2010

机译：用于微辐射热计应用的脉冲直流磁控溅射氧化钒薄膜的制备，表征和沉积后修饰
6. Biocompatibility and Surface Properties of TiO2 Thin Films Deposited by DC Magnetron Sputtering [O] . Francisco López-Huerta, Blanca Cervantes, Octavio González, 2014

机译：直流磁控溅射沉积TiO2薄膜的生物相容性和表面性质
7. Characteristic Properties of TiN Thin Films Prepared by DC Magnetron Sputtering Method for Hard Coatings [O] . Young-Ryeol Kim, Yong-Seob Park, Won-Seok Choi, 2008

机译：用硬涂层DC磁控溅射法制备锡薄膜的特性

Preparation and Conductive Properties of Ag Thin Film by DC Magnetron Sputtering Method

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