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An Optical Method for Monitoring Metal Contamination during Aqueous Processing of Silicon Wafers

机译：一种监测硅片水溶液中金属污染的光学方法

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Dinesh Chopra; Ian Ivar Suni;
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年度 2015
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1. Kinetic Limitations on Metal Dissolution during Aqueous Silicon Wafer Processing [J] . Ian Ivar Suni Electrochemical and solid-state letters . 1998,第2期

机译：硅晶圆水处理过程中金属溶解的动力学限制
2. A comparative analysis of different measurement techniques to monitor metal and organic contamination in silicon device processing [J] . M. L. Polignano, D. Codegoni, S. Grasso, Physica status solidi . 2015,第3期

机译：在硅器件加工过程中监测金属和有机污染物的不同测量技术的比较分析
3. Optimizing silicon processing for in-line monitoring of metal contamination [J] . A Cacciato, S Evseev, H J van der Heijden Semiconductor science and technology . 2000,第7期

机译：优化硅工艺以在线监测金属污染
4. Surface contaminations on silicon wafers — Monitoring of cleaning processes and specifying wafer quality [C] . Meyer S. Photovoltaic Specialists Conference (PVSC), 2011 37th IEEE . 2011

机译：硅晶片上的表面污染—监控清洗过程并指定晶片质量
5. A materials approach to silicon wafer level contamination issues from the wet clean process [D] . Hall, Lindsey Harrison 1996

机译：解决湿法清洁过程中硅片污染问题的材料方法
6. Rapid Processing of Wafer-Scale Anti-Reflecting 3D Hierarchical Structures on Silicon and Its Templation [O] . Harsimran Singh Bindra, Jaikrishna R., Tushar Kumeria, 2018

机译：硅片上晶圆级抗反射3D分层结构的快速处理及其模板
7. Detection of Metal Contamination on Silicon Wafer Backside and Edge by New TXRF Methods [O] . Hiroshi Kohno, Motoyuki Yamagami, Joseph Formica, 2009

机译：新型TXRF方法检测硅晶片背面和边缘的金属污染
8. Optical Monitoring of Photo-Acoustic Pulse Propagation in Silicon Wafers [R] . Sontag, H., Tam, A. C. 1985

机译：硅片中光声脉冲传播的光学监测

An Optical Method for Monitoring Metal Contamination during Aqueous Processing of Silicon Wafers

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