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Analysis of Fitness Functions for Electron-Beam Lithography Simulation and Evolutionary Optimization

机译：电子束光刻模拟和进化优化的适应度函数分析

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Franck Robin; Esteban Moreno;
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年度 2015
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1. Simulation and evolutionary optimization of electron-beam lithography with genetic and simplex-downhill algorithms [J] . Robin F., Orzati A., Moreno E., IEEE transactions on evolutionary computation . 2003,第1期

机译：遗传和单纯形下坡算法对电子束光刻的仿真和进化优化
2. Enhancement of spatial resolution in generating point spread functions by Monte Carlo simulation in electron-beam lithography [J] . S.-Y. Lee, Q. Dai, S.-H. Lee, Journal of Vacuum Science & Technology . 2011,第6期

机译：电子束光刻中蒙特卡罗模拟提高了生成点扩散函数的空间分辨率
3. Fitness functions for evolutionary optimization of rate parameters in chemically reacting systems [J] . Siouris Spiridon, Blakey Simon Chemical Engineering Science . 2019,第期

机译：化学反应系统中速率参数进化优化的健身功能
4. On Non-elitist Evolutionary Algorithms Optimizing Fitness Functions with a Plateau [C] . Anton V. Eremee International Conference on Mathematical Optimization Theory and Operations Research . 2020

机译：优化高原适应度函数的非精英进化算法
5. Thin-film gated photocathodes for multiple-beam electron-beam lithography. [D] . Pei, Zeting. 2001

机译：用于多束电子束光刻的薄膜栅极光阴极。
6. Cellulase Linkers Are Optimized Based on Domain Type and Function: Insights from Sequence Analysis Biophysical Measurements and Molecular Simulation [O] . Deanne W. Sammond, Christina M. Payne, Roman Brunecky, -1

机译：纤维素酶的接头是优化的基于上域类型和功能：从序列分析生物物理测量见解和分子模拟
7. Simulation and Evolutionary Optimization of Electron-Beam Lithography with Genetic and Simplex-Downhill Algorithms [O] . Franck Robin, Andrea Orzati, Student Member, 2003

机译：基于遗传和单向下行算法的电子束光刻仿真与进化优化

Analysis of Fitness Functions for Electron-Beam Lithography Simulation and Evolutionary Optimization

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