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Large Area High Density Sub-20 nm SiO2 Nanostructures Fabricated by Block Copolymer Template for Nanoimprint Lithography

机译：纳米压印光刻用嵌段共聚物模板制备大面积高密度亚20nm siO2纳米结构

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Hui Joon Park; Myung-gyu Kang; L. Jay Guo;
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年度 2014
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专利

1. Large area high density sub-20 nm SiO_2 nanostructures fabricated by block copolymer template for nanoimprint lithography [J] . Park H.J., Kang M.-G., Guo L.J. ACS nano . 2009,第9期

机译：嵌段共聚物模板制备的纳米压印光刻大面积高密度亚20 nm SiO_2纳米结构
2. Integration of nanoimprint lithography with block copolymer directed self-assembly for fabrication of a sub-20 nm template for bitpatterned media [J] . XiaoMin Yang, Shuaigang Xiao, Wei Hu, Nanotechnology . 2014,第39期

机译：纳米压印光刻技术与嵌段共聚物定向自组装的集成，用于制造位图介质的20 nm以下模板
3. Macroscopic high density nanodisc arrays of zinc oxide fabricated by block copolymer self-assembly assisted nanoimprint lithography [J] . Vignesh Suresh, Meiyu Stella Huang, M. P. Srinivasan Journal of Materials Chemistry: An Interdisciplinary Journal dealing with Synthesis, Structures, Properties and Applications of Materials, Particulary Those Associated with Advanced Technology . 2012,第41期

机译：嵌段共聚物自组装辅助纳米压印光刻技术制备的氧化锌宏观高密度纳米圆盘阵列
4. Fabrication of templates with rectangular bits on circular tracks by combining block copolymer directed self-assembly and nanoimprint lithography [C] . Lei Wan, Ricardo Ruiz, He Gao, Alternative lithographic technologies IV. . 2012

机译：通过结合嵌段共聚物定向自组装和纳米压印光刻技术，在圆形轨道上制作具有矩形位的模板
5. Self-Assembly of Block Copolymer Thin Films for Fabricating Tailored Nanostructures [D] . Zhou, Chun. 2019

机译：嵌段共聚物薄膜的自组装，用于制造定制纳米结构
6. Nanopatterning via Self-Assembly of a Lamellar-Forming Polystyrene-block-Poly(dimethylsiloxane) Diblock Copolymer on Topographical Substrates Fabricated by Nanoimprint Lithography [O] . Dipu Borah, Cian Cummins, Sozaraj Rasappa, 2018

机译：通过自组装形成层状聚苯乙烯嵌段聚（二甲基硅氧烷）二嵌段共聚物通过纳米压印光刻技术制备的纳米图案。
7. Nanostructure transfer using cyclic olefin copolymer templates fabricated by thermal nanoimprint lithography [O] . Li W, TANG X, LI S, 2014

机译：使用通过热纳米压印光刻制造的环烯烃共聚物模板进行纳米结构转移

Large Area High Density Sub-20 nm SiO2 Nanostructures Fabricated by Block Copolymer Template for Nanoimprint Lithography

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