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Influence of Post Annealing Temperature on the Properties of ZnO Films Prepared by RF Magnetron Sputtering

机译：退火后温度对射频磁控溅射制备ZnO薄膜性能的影响

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S. Ahmad; N. D. Md Sin; M. N. Berhan; M. Rusop;
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年度 2015
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1. Effect of annealing temperature on the structural and optical properties of ZnO thin films prepared by RF magnetron sputtering [J] . Daniel GP, Justinvictor VB, Nair PB, Physica, B. Condensed Matter . 2010,第7期

机译：退火温度对射频磁控溅射ZnO薄膜结构和光学性能的影响
2. Influence of the oxygen partial pressure and post-deposition annealing on the structure and optical properties of ZnO films grown by dc magnetron sputtering at room temperature [J] . Yuste M., Escobar Galindo R., Caretti I., Journal of Physics, D. Applied Physics: A Europhysics Journal . 2012,第2期

机译：氧分压和沉积后退火对室温磁控溅射ZnO薄膜结构和光学性能的影响
3. Effects of post-annealing temperature on structural, optical, and electrical properties of ZnO and Zn_(1-x)Mg_xO films by reactive RF magnetron sputtering [J] . Chul-Hwan Choi, Seon-Hyo Kim Journal of Crystal Growth . 2005,第1a2期

机译：反应射频磁控溅射后退火温度对ZnO和Zn_（1-x）Mg_xO薄膜结构，光学和电学性质的影响
4. Influence of Post Annealing Temperature on the Properties of ZnO Films Prepared by RF Magnetron Sputtering [C] . S. Ahmad, N. D. Md Sin, M. N. Berhan, International Conference on Advances in Manufacturing and Materials Engineering . 2012

机译：退火温度对RF磁控溅射制备的ZnO膜性能的影响
5. The Influence of Hydrogen Annealing and Substrate Temperature on the Properties of RF Sputtered Zinc Oxide Thin Films [D] . Olanrewaju, Alade Ibrahim. 2014

机译：氢退火和衬底温度对射频溅射氧化锌薄膜性能的影响
6. Processing and Study of Optical and Electrical Properties of (Mg Al) Co-Doped ZnO Thin Films Prepared by RF Magnetron Sputtering for Photovoltaic Application [O] . Chayma Abed, Susana Fernández, Selma Aouida, 2020

机译：射频磁控溅射制备（MgAl）共掺杂ZnO薄膜的光电性能研究与研究
7. Annealing Effects on the Structural, Optical, and UV Photoresponse Properties of ZnO Nanostructures Prepared by RF-Magnetron Sputtering at Different Deposition Temperatures [O] . Husam S. Al-Salman, M. J. Abdullah 2014

机译：在不同沉积温度下RF-磁控溅射制备的ZnO纳米结构的结构，光学和UV光响应性的退火效应

Influence of Post Annealing Temperature on the Properties of ZnO Films Prepared by RF Magnetron Sputtering

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