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Advanced Aqueous Cleaner I, Dilute solutions for the selective removal of Post etch residues in the presence of Aluminium.

机译：advanced aqueous Cleaner I，稀释溶液，用于在铝存在下选择性去除蚀刻后残留物。

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J. Daviot; C. Reid; D. Holmes; East Kilbride; G Ql;
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1. Advanced Aqueous Cleaner I, Dilute solutions for the selective removal of Post etch residues in the presence of Aluminium [J] . J. Daviot, C. Reicl, D. Holmes Diffusion and Defect Data. Solid State Data, Part B. Solid State Phenomena . 2005,第0期

机译：先进的水性清洁剂I，用于在铝存在下选择性去除蚀刻后残留物的稀溶液
2. Evaluation of Post Etch Residue Cleaning Solutions for the Removal of Tin Hardmask after Dry Etch of Low-K Dielectric Materials on 45 nm Pitch Interconnects [J] . Makonnen Payne, Steve Lippy, Ruben Lieten, Diffusion and Defect Data. Solid State Data, Part B. Solid State Phenomena . 2016,第Null期

机译：在45 nm间距互连线上干蚀刻低K介电材料后去除锡硬掩模的蚀刻后残留清洗液的评估
3. Selective wet removal of Hf-based layers and post-dry etch residues in high-frand metal gate stacks [J] . M. Claes, V. Paraschiv, S. Beckx, Diffusion and Defect Data. Solid State Data, Part B. Solid State Phenomena . 2005,第0期

机译：选择性湿法去除Hf基层和高级金属栅极堆叠中的干后蚀刻残留物
4. Advanced Aqueous Cleaner I, Dilute solutions for the selective removal of Post etch residues in the presence of Aluminium [C] . J. Daviot, C. Reid, D. Holmes, International Symposium on Ultra Clean Processing of Silicon Surfaces . 2005

机译：高级水性清洁剂I，在铝存在下选择性去除蚀刻后残留物的稀释解决方案
5. Fluorocarbon post-etch residue removal using radical anion chemistry. [D] . Timmons, Christopher L. 2005

机译：使用自由基阴离子化学去除碳氟化合物蚀刻后残留物。
6. Kinetic and Isotherm Study of As(III) Removal from Aqueous Solution by PET Track-Etched Membranes Loaded with Copper Microtubes [O] . Alyona V. Russakova, Liliya Sh. Altynbaeva, Murat Barsbay, 2021

机译：通过用铜微管的PET轨道蚀刻膜从水溶液中除去作为（iii）的动力学和等温物研究
7. Challenges and novel approaches for photo resist removal and post-etch residue removal for 22 nm interconnects [O] . Mertens P., Kim T., Claes M., 2009

机译：用于22 nm互连的光刻胶去除和蚀刻后残留物去除的挑战和新颖方法
8. Effect of oxidation on the removal Cu(2+), Cd(2+) and Mn (VII) from dilute aqueous solutions by Upper Freeport bituminous coal. Quarterly report, June--August 1995 [R] . Bodine, D. L. 1995

机译：氧化对上游自由口烟煤去除稀水溶液中Cu（2 +），Cd（2+）和mn（VII）的影响。季度报告，1995年6月至8月

Advanced Aqueous Cleaner I, Dilute solutions for the selective removal of Post etch residues in the presence of Aluminium.

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