首页> 外文OA文献 >Cobalt Thin Film Deposited by Remote Plasma Atomic Layer Deposition Method using C12H10O6(Co)2 and CpCo(CO)2

【2h】

Cobalt Thin Film Deposited by Remote Plasma Atomic Layer Deposition Method using C12H10O6(Co)2 and CpCo(CO)2

机译：使用C12H10O6（Co）2和CpCo（CO）2通过远程等离子体原子层沉积法沉积钴薄膜

页面导航

著录项
引文网络
相似文献
相关主题

著录项

作者
Keunwoo Lee; Keunjun Kim; Wooho Jeong; Taeyong Park; Hyeongtag Jeona;
展开▼
作者单位

展开▼
年度 2015
总页数
原文格式 PDF
正文语种
中图分类

相似文献

外文文献
中文文献
专利

1. Cobalt Thin Film Deposited by Remote Plasma Atomic Layer Deposition Method using C12H10O6(Co)2 and CpCo(CO)2 [J] . Keunwoo Lee, Keunjun Kim, Wooho Jeong, Diffusion and Defect Data. Solid State Data, Part B. Solid State Phenomena . 2007,第1期

机译：使用C12H10O6（CO）2和CPCO（CO）2，通过远程血浆原子层沉积方法沉积的钴薄膜。
2. Comparison of Co Films Deposited by Remote Plasma Atomic Layer Deposition Method with Cyclopentadienylcobalt Dicarbonyl [CpCo(CO)_2] and Dicobalt Octacarbonyl [Co_2(CO)_8] [J] . Keunjun KIM, Keunwoo LEE, Sejin HAN, Japanese Journal of Applied Physics. Part 2, Letters & Express Letters . 2007,第8a11期

机译：远程等离子体原子层沉积法与环戊二烯基钴二羰基[CpCo（CO）_2]和八羰基二钴[Co_2（CO）_8]沉积的钴膜的比较
3. Characteristics of Cobalt Thin Films Deposited by Very High Frequency Plasma Enhanced Atomic Layer Deposition (60 and 100 MHz) Using Cobaltocene (Co(Cp)(2))/NH3 [J] . Yeom Won Gyun, Song Chang Hoon, Cho Chul Hee, Journal of nanoscience and nanotechnology . 2021,第3期

机译：使用钴茂（CO（CP）（2））/ NH3，由非常高频率增强原子层沉积（60和100MHz）沉积的钴薄膜的特性（60和100MHz）/ NH3
4. Cobalt Thin Film Deposited by Remote Plasma Atomic Layer Deposition Method using C_(12)H_(10)O_6(Co)_2 and CpCo(CO)_2 [C] . Keunwoo Lee, Keunjun Kim, Wooho Jeong, IUMRS International Conference in Asia . 2007

机译：使用C_（12）H_（10）O_6（CO）_2和CPCO（CO）_2的远程等离子体原子层沉积方法沉积的钴薄膜。
5. Growth, characterization and post-processing of inorganic and hybrid organic-inorganic thin films deposited using atomic and molecular layer deposition techniques. [D] . Abdulagatov, Aziz Ilmutdinovich. 2012

机译：使用原子和分子层沉积技术沉积的无机和杂化有机-无机薄膜的生长，表征和后处理。
6. Surface Passivation of Silicon Using HfO2 Thin Films Deposited by Remote Plasma Atomic Layer Deposition System [O] . Xiao-Ying Zhang, Chia-Hsun Hsu, Shui-Yang Lien, 2017

机译：利用远程等离子体原子层沉积系统沉积的HfO2薄膜对硅进行表面钝化
7. Structural Studies of Mono-Atomic Layer-Deposited (FePt)1-xCux Thin Films and FePt Thin Films with Pt Top-Layer Deposition [O] . XZ Li, YS Yu, T George, 2010

机译：单型原子层沉积（FEST）1-Xcux薄膜的结构研究和具有PT顶层沉积的缩膜薄膜

Cobalt Thin Film Deposited by Remote Plasma Atomic Layer Deposition Method using C12H10O6(Co)2 and CpCo(CO)2

著录项

引文网络

相似文献

相关主题

期刊订阅