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An In- House approach for fabrication of Poly- Silicon Nanobiosensor using Conventional Photolithography and Etching Method

机译：使用常规光刻和蚀刻方法制造多晶硅纳米生物传感器的内部方法

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M. Nuzaihan M. N; U. Hashim; C. H. Voon; A. Rahim Ruslinda;
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年度 2016
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1. An in-house approach for fabrication of silicon nanowire arrays using electroless metal deposition and etching method [J] . Purnima Hazra, Satyabrata Jit International Journal of Surface Science and Engineering . 2013,第3期

机译：使用化学沉积和蚀刻方法制造硅纳米线阵列的内部方法
2. Fabrication of high-aspect-ratio silicon nanopillar arrays with the conventional reactive ion etching technique [J] . Y.-F. CHANG, Q.-R. CHOU, J.-Y. LIN, Applied Physics. A, Materials Science & Processing . 2007,第2期

机译：使用常规反应离子刻蚀技术制备高纵横比的硅纳米柱阵列
3. New release process for polysilicon surface micromachining using sacrificial polysilicon anchor and photolithography after sacrificial etching [J] . Xiao Zhixiong, Li Ting, Zhang Guobing, Journal of Micromechanics and Microengineering . 1999,第4期

机译：牺牲蚀刻后使用牺牲多晶硅锚和光刻技术进行多晶硅表面微加工的新工艺
4. An In-House approach for fabrication of Poly-Silicon Nanobiosensor using Conventional Photolithography and Etching Method [C] . M. Nuzaihan M. N., U. Hashim, C. H. Voon, Malaysia-Japan International Conference on Nanoscience, Nanotechnology and Nanoengineering . 2015

机译：一种使用常规光刻和蚀刻方法制备多晶硅纳米型囊传感器的内部方法
5. Reactive ion etching of crystalline silicon carbide and fabrication of silicon carbide devices. [D] . Yih, Pei Haur. 1994

机译：结晶碳化硅的反应离子刻蚀和碳化硅器件的制造。
6. Cryogenic Etching of Silicon: An Alternative Method For Fabrication of Vertical Microcantilever Master Molds [O] . Kweku A. Addae-Mensah, Scott Retterer, Susan R. Opalenik, -1

机译：硅的低温腐蚀：垂直微悬臂梁母模的另一种方法进行制造
7. Fabrication of Silicon Carbide Quantum Dots via Chemical-Etching Approach and Fluorescent Imaging for Living Cells [O] . Yuepeng Song, Dongsheng Gao, Hyoung Seop Kim, 2016

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8. X-Ray Lithography for sub-100-nm-Channel-Length Transistors Using Masks Fabricated with Conventional Photolithography, Anisotropic Etching, and Oblique Shadowing [R] . Chou, S. Y., Smith, H. I., Antoniadis, D. A. 1985

机译：用于亚100nm通道长度晶体管的X射线光刻技术，采用常规光刻，各向异性蚀刻和斜阴影制作的掩模

An In- House approach for fabrication of Poly- Silicon Nanobiosensor using Conventional Photolithography and Etching Method

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